【NL-N93X】High RI Imprint Resin
【NL-N93X】Nanoimprint Resin for Meta-Optics, Photonics and DOE
High refractive index (nD 1.93) imprint materials for meta-optics and photonics.
High Refractive Index (nD 1.93) Imprint Material nD 1.93 High Refractive Index UV Imprint Material for Metaoptics and Photonics - For meta lenses, meta surfaces, and other metaoptics - DOE - Silicon Photonics - AR / XR
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basic information
Refractive index: 1.93 @589 nm Filler: TiO2 (rutile) particles Particle diameter: ~10 nm (average) Filling amount: ~65 vol% Curing shrinkage (linear): ~3% Coating method: Spin coating Film thickness: ~50 nm – ~1 μm Curing light source: 365 / 385 / 405 nm Recommended replica: Hard epoxy replica Previous item transmittance: 94% (1μm film) Haze: < 0.1% (1μm film)
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Applications/Examples of results
- Meta lenses, meta surfaces, and other meta optics - DOE - Silicon photonics - AR / XR
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Company information
Nakamura Chemical Industry Co., Ltd. has been engaged in the manufacturing and sales of plant-based dyes since its establishment in 1938, and has developed a business focused on the manufacturing and sales of chemical products centered around acrylic resins. With close collaboration among research and development, manufacturing, sales, and quality assurance, we quickly respond to our customers' needs, so please feel free to contact us with any requests.
