NK OPTIMER (General Overview)
UV-Curable Optical Materials for NIL and Advanced Photonics
UV-Curable Optical Materials for NIL and Advanced Photonics
This is a solvent-free photo-curable resin suitable for creating fine optical elements from the μm to nm order using imprint technology. It is a material suitable for imprinting without solvents. It can also accommodate solvent-diluted thin films in the nm order. It has excellent spin-coating suitability. Low curing shrinkage. High heat resistance (solder reflow resistance). High transparency. Can be prepared with nD 1.46 - 1.68. For more details, please refer to the brochure or contact us.
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basic information
This is a solvent-free photo-curable resin suitable for creating fine optical elements in the μm to nm order using imprint technology. It is a material suitable for imprinting without solvents. It can also accommodate solvent-diluted thin films in the nm order. It has excellent spin coating suitability. Low curing shrinkage. High heat resistance (solder reflow resistance). High transparency. Can be prepared with an nD of 1.46 - 1.68. For more details, please refer to the brochure or contact us.
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Applications/Examples of results
❖Nanoimprint Lithography (NIL) ❖Diffractive / Micro lens arrays (DOE / MLA) ❖Wafer-level optics (WLO) ❖AR/MR displays & waveguides ❖Silicon photonics packaging
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Company information
Nakamura Chemical Industry Co., Ltd. has been engaged in the manufacturing and sales of plant-based dyes since its establishment in 1938, and has developed a business focused on the manufacturing and sales of chemical products centered around acrylic resins. With close collaboration among research and development, manufacturing, sales, and quality assurance, we quickly respond to our customers' needs, so please feel free to contact us with any requests.
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