Resists for UV-NIL (via RIE)
It is a UV-NIL resist. It has excellent spin coating characteristics. It has excellent NIL characteristics. It has high etching resistance. ❖ No need for a primer treatment before coating. ❖ Easily forms a thin film with superior thickness uniformity by spin coating. ❖ Low volatility during vacuum defoaming on wafer. ❖ Low volatility during hot-air drying on wafer. For more details, please refer to the brochure or contact us.
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basic information
It is a UV-NIL resist. It has excellent spin coating characteristics. It has excellent NIL characteristics. It has high etching resistance. ❖ No need for a primer treatment before coating. ❖ Easily forms a thin film with superior thickness uniformity by spin coating. ❖ Low volatility during vacuum defoaming on wafer. ❖ Low volatility during hot-air drying on wafer. Selectivity ratio Al2O3: 1.0 TiO2: 0.6 For more details, please refer to the brochure or contact us.
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Nakamura Chemical Industry Co., Ltd. has been engaged in the manufacturing and sales of plant-based dyes since its establishment in 1938, and has developed a business focused on the manufacturing and sales of chemical products centered around acrylic resins. With close collaboration among research and development, manufacturing, sales, and quality assurance, we quickly respond to our customers' needs, so please feel free to contact us with any requests.
