Titanium (Ti) target with a maximum purity of ≧5N5.
In the semiconductor industry, the film formation process significantly affects product performance through the creation of high-quality thin films. Particularly as miniaturization progresses, the purity, uniformity, and sputtering efficiency of target materials become crucial. Contamination by impurities and non-uniform film thickness can lead to decreased reliability of devices and worsened yield. Our titanium (Ti) targets achieve a maximum purity of 5N5, enabling high-quality film formation through PVD and magnetron sputtering. 【Application Scenarios】 - Formation of metal wiring in semiconductor device manufacturing - Production of thin-film transistors (TFT) - Manufacturing of various sensor devices 【Benefits of Implementation】 - High-quality thin film formation with high-purity titanium - Uniform film thickness and excellent adhesion - Improved device reliability and yield enhancement
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basic information
【Features】 - Purity: Supports from 2N5 to 5N5 - Various shapes including planar, rotary target, and non-standard shapes - Compatible with PVD and magnetron sputtering - Also offers titanium alloy targets (Ti−Al, Ti−Ni, Ti−Cu, Ti−Cr, etc.) - Adjustable thin film properties such as hardness and conductivity 【Our Strengths】 We have established a close partnership with a Japan-based local factory in China that possesses world-class technology in sputtering targets and bonding services. We provide high-quality, cost-effective products and services to support the growth of our customers' businesses.
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【Main Applications】 ■ Semiconductor and electronics industry ■ Optical coatings ■ Medical devices ■ Aerospace ■ Decorative and protective coatings ■ New energy ■ Solar cells *For more details, please download the PDF or feel free to contact us.
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Company information
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.
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