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  6. Thermal and UV Nanoimprint Device X-300

Thermal and UV Nanoimprint Device X-300

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Thermal and UV Nanoimprint Equipment

last updated:Jul 15, 2020

SCIVAX
SCIVAX
  • Official site

The X-300 is ideal for the development of advanced nanoimprint technology. It supports both thermal and UV processes with a 6-inch diameter and is characterized by high reproducibility.

From R&D to pilot production, we have addressed all stages, pursuing high quality, low cost, and high production efficiency. The X-300 is an ideal nanoimprint device for full-scale technology development. ■□■Features■□■ ■Processing method: Thermal, UV ■Processing size: Up to 100mm (Thermal φ150mm) ■Minimum displacement resolution: 50nm ■Pressing force: Maximum operating: 50kN ■Mold parallelism adjustment mechanism: Standard equipped ■Resist processing - Control possible with residual film below 5nm - Confirmed durability of 150,000 shots through mold technology development ■Film processing - Product manufacturing through practical lines (cell culture plates) - Capable of various pattern processing from nano to micron At SCIVAX, we provide various proposals for substrate processing using film and resist. Regarding LEDs, various optical elements (optical films), and various electronic devices, we will propose mass production processes tailored to your applications. For other functions and details, please contact the SCIVAX Microfabrication Division (Phone: 044-599-5051, Email: nil-contact@scivax.com).

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Thermal and UV Nanoimprint Device X-300

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basic information

From R&D to pilot production, we have addressed all stages, pursuing high quality, low cost, and high equipment productivity. The X-300 is an ideal nanoimprint device for full-scale technology development. ■□■ Features ■□■ ■ Processing method: Thermal, UV ■ Processing size: Up to 100mm (Thermal φ150mm) ■ Minimum displacement resolution: 50nm ■ Maximum pressure: 50kN ■ Mold parallelism adjustment mechanism: Standard equipped ■ Resist processing - Control possible with residual film of 5nm or less - Confirmed durability of 150,000 shots through mold technology development ■ Film processing - Product manufacturing using practical lines (cell culture plates) - Capable of various pattern processing from nano to micron At SCIVAX, we provide various proposals for substrate processing using film and resist. Regarding LEDs, various optical elements (optical films), and various electronic devices, we will propose mass production processes tailored to your applications. For other functions and details, please contact the SCIVAX Microfabrication Division (Phone: 044-599-5051, Email: nil-contact@scivax.com).

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P7

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Applications/Examples of results

UV, thermoplastic, thermosetting, various nano-imprinting processes ■Examples of Applications■ ■Molding of resin sheets ■Resist molding processing ■Glass materials and molding ■Film molding ■Formation of ultra-fine structures for LEDs ■Fine pattern transfer

Company information

SCIVAX

SCIVAX

Industrial Machinery

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To perform nano-sized microfabrication at a low cost, various technological elements such as equipment, optical design, molds, materials, nanoimprinting, etching, and inspection are essential. Our company has engineers from various fields and can provide the necessary technological elements required by our customers. We offer comprehensive support that goes above and beyond to meet the diverse needs of our customers, whether for optical applications or electronic applications. If you are considering microfabrication, especially nano wafer processing, please do not hesitate to contact us.

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