CVD equipment
●Features This device is a thin film fabrication apparatus using the CVD method, which supplies raw material gases (gases, liquids, solids) to the CVD reaction chamber, causing chemical reactions to occur in the gas phase or on the surface of the substrate material, and utilizing gas-phase reactions and surface reactions to deposit the desired thin film material onto the substrate. Methods for chemically activating the raw material gases (exciting them) include thermal, plasma, and optical (laser, ultraviolet, etc.), with corresponding devices such as thermal CVD, plasma CVD, and optical CVD.
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basic information
●Features This device is a thin film fabrication apparatus using the CVD method, which supplies raw material gas substances (gases, liquids, solids) to the CVD reaction chamber, causing chemical reactions to occur in the gas phase or on the surface of the substrate material, and utilizing gas-phase reactions and surface reactions to deposit the desired thin film material onto the substrate. Methods for chemically activating the raw material gas substances (exciting them) include thermal, plasma, and optical (laser, ultraviolet, etc.), with corresponding devices such as thermal CVD, plasma CVD, and optical CVD.
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Applications/Examples of results
The University of Tokyo, Tokyo Institute of Technology, National Institute for Materials Science, National Institute of Advanced Industrial Science and Technology, among others.
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Company information
The history of Kitano Seiki is also a trajectory of continuous contribution to cutting-edge research fields through the provision of precision instruments for research and development. In November 1958, we were established as a company specializing in the design, manufacturing, and sales of precision instruments. Since then, we have developed and manufactured experimental equipment aimed at research institutes in universities and government agencies, as well as basic research laboratories in private companies, earning high praise for our excellent quality and reliability. In particular, in recent years, we have been at the forefront of ultra-high vacuum and ultra-low temperature technologies, which are essential in industrial fields such as new materials, nanotechnology, flat panel displays, high-temperature superconductivity, solar cells, nuclear power, and space development. We have accumulated abundant technology and know-how in creating experimental environments and have linked this to the development and provision of equipment that condenses advanced performance and functionality. At Kitano Seiki, we always work closely with researchers, our users, to design and develop equipment that accurately supports research and development objectives. With a consistent system from parts manufacturing to various processing, assembly, inspection and testing, equipment setup, and after-sales support, we provide high-quality products and a conducive experimental environment for quality research and development.
