Exposure tool for research and development of photoresists
UVES-2000, UVES-2500, ArFES-3500LP, VUVES-4500mini, IMESq-5500, etc.
Photo Process Analysis Exposure Device Series
<Main lineup of resist analysis exposure equipment> ■UVES-2000 (Supports g-line/h-line/i-line/248nm and broad light analysis exposure equipment) ■VUVES-4700i (Supports 248nm, 193nm exposure, and 193nm immersion exposure) ■EUVES-7000 (Equipped with an EUV light source, capable of 13.5nm open frame exposure)
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basic information
<Overview of the Device> ■ It is possible to perform step exposure on a single wafer while varying the exposure conditions. ■ By analyzing the developed sample using a resist development analyzer, the development of photoresist materials and processes can be accelerated. For other functions and details, please contact us.
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Applications/Examples of results
Since its establishment, Risotech Japan has been a specialist in lithography, quickly responding to customer requests with products ranging from development speed analysis devices, lithography simulators, coaters, developers, to cutting-edge exposure systems for process evaluation. For more details, please contact us.
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Company information
Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.