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  6. Cross-edge microfabrication [silicon products]

Cross-edge microfabrication [silicon products]

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last updated:Apr 11, 2017

テクニスコ
テクニスコ
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Material purity of 99.999999999% or higher! Impurity contamination management is implemented with dedicated silicon equipment.

We use a material with the same thermal expansion rate as silicon wafers to reduce slip occurrence on the wafers.

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Cross-edge microfabrication [silicon products]

silicon.jpg
silicon.jpg

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【Features】 ○ Implementation of impurity contamination management with dedicated silicon equipment ○ Slip-free Adopts materials with the same thermal expansion rate as silicon wafers to reduce slip occurrence on wafers ○ Reduced running costs due to improved durability Excellent heat resistance enhances durability against thermal deformation ○ Cleaning quality management Contamination management is conducted in a silicon-dedicated clean room to reduce contamination and particles ○ Mirror finish processing available on the bottom surface of the recess Achieves uniform temperature distribution during semiconductor wafer heat treatment, improving quality variation ○ Custom shape and size options available ● For other functions and details, please download the catalog or contact us.

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【Applications】 ○ Optical waveguide wafer jig ○ EP tray ○ Inner wall plates of implant domes and various tables ○ CVD susceptor and rings, etc. ● For more details, please contact us.

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Cross Edge Microfabrication Comprehensive Catalog [Latest Edition]

Cross Edge Microfabrication Comprehensive Catalog [Latest Edition]

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テクニスコ

テクニスコ

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We will propose the most suitable solutions that match our customers' requirements, considering quality, cost, and mass production, through our advanced composite processing technology (Cross Edge Micro Machining), which combines five cutting-edge techniques: cutting, grinding, polishing, metalizing, and joining.

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