Low process temperature in thin film deposition
A vacuum deposition system capable of forming high-purity films.
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This is a thin film synthesis method that utilizes glow discharge generated by decomposing source gases through plasma-assisted CVD. To generate glow discharge, power in a diverse frequency range of 0 to 13.56 MHz is used. ■□■Advantages■□■ ■Formation of high-purity films is possible ■Diverse thin films can be formed depending on the source gas ■Uniformity and high deposition rates even when coating large areas ■Easy control and capable of large-scale processing ■Low processing temperatures in thin film deposition ●For more details, please request materials or download the catalog●
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Vacuum deposition system
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The pursuit of cutting-edge technology is, at the same time, an effort to minimize the burden on the natural environment to the greatest extent possible. Our technology plays a vital role in the manufacturing process to enable coexistence with the creatures that inhabit the beautiful oceans, rivers, and mountains of this Earth. With a commitment to ecology, we, as pioneers in thermal science, are promoting the development of high-value-added products that pursue specialties such as technologies for improving mechanical functions aimed at the development of pollution-free vehicles. Additionally, through proactive business development, including diversified management expansion and entry into new fields of competitive product technology, we are working to stabilize our management foundation. Furthermore, through technological partnerships with top leaders who possess world-class technology, we are accumulating a new sense of the era and advanced technological capabilities, earning strong trust from users around the world.