Vacuum deposition EB source/power supply NEB-10W type NEB-10WE type
NEB-10W model NEB-10WE model
Third generation EB control power supply for ultra-multilayer films.
【Vacuum Deposition EB Source and Power Supply NEB-10W Type NEB-10WE Type】 The NEB-10WE type power supply is designed for a dual electron beam source. It simplifies the control panel of the NEB-10W type power supply and offers a more economical option. 〈Features〉 - Rate control is possible with an external emission control circuit! - Standard equipped with monitoring output circuits for acceleration voltage, emission current, and filament current! - Capable of external X/Y scan control and external X/Y position control! - Standard equipped with a discharge suppression device! - The main unit is designed to be compact and small! *For more details, please contact us or download the catalog.*
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【Specifications】 Maximum beam output: 10kW Power supply: 3Φ 200V ±10% 13kVA Acceleration voltage: -4kV to -10kV Ripple rate: 5% or less Emission current: 0 to 1000mA Beam position: ±15mm (X/Y) Beam scan: ±15mm (X/Y), optional ±20mm Beam scanning frequency: X=50Hz, Y=500Hz External control signals: Approximately 15 items Weight: 250kg ● For other functions and details, please download the catalog.
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