High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.
If the pressure is the same, the water usage is 1/3; if the flow rate is the same, the pressure is 3 times; with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
A cleaning nozzle unit that requires less water and is less likely to form a water film, which can be retrofitted to existing equipment. A cleaning nozzle that operates at a maximum of 30Hz. A pump that generates high-pressure water of 5 to 10 MPa. A combination of control units. Conventional continuous spraying applies pressure over a self-created water film, which tends to increase cleaning power = increase pressure = increase flow rate, resulting in a thicker water film. However, the DP-Gun uses intermittent spraying, which results in a lower flow rate at the same pressure (impact), making it less likely to form a water film and allowing the sprayed water to directly impact the target object. By repeatedly applying intermittent spray impacts, it demonstrates excellent cleaning effects for removing foreign substances from the items being cleaned, cleaning masks, and cleaning three-dimensional objects such as cassettes (with narrow grooves and intricate shapes). The pump unit achieves stable water pressure control with minimal water waste during pressure adjustments by performing feedback control in accordance with flow rate changes caused by the opening and closing of the nozzle. *Please consult us regarding the spraying of a fixed amount of liquid and spray application measurement. *Regular maintenance of the nozzle and pump is required.
- Company：株式会社ダン科学 入間営業所
- Price：Other
