We will begin offering new options and solutions for photochemical material filtration using widely used polyethylene and nylon.
Cobetter has released a polyimide membrane filter as part of its new lineup. This marks the introduction of a new option and solution for photochemical material filtration, widely used with polyethylene and nylon.
The polyimide membrane, which has high chemical resistance and heat resistance for semiconductor filters, is also extremely excellent in terms of cleanliness, and it is expected to contribute to critical processes through fluid passage in its unique porous structure.
We have released UPE Sub 1nm/Nylon 1nm and started mass production in various shapes and sizes, from POU and capsule filters to cartridge filters. We have also assembled a lineup of precision filtration filters for advanced processes.
The newly released Photoami filters include 1nm and 2nm for cutting-edge applications, and we have also added 0.1um pore size to meet the needs for coarse filtration and high-viscosity liquid filtration.
With high removal rates, high flow rates, and extremely high cleanliness, we expect improved performance in the filtration of many photochemical materials and organic solvents.
*For more details, please refer to the PDF document or feel free to contact us.