An incident where hydrochloric acid was generated due to improper disposal of waste liquid from chemicals used in a semiconductor manufacturing facility, resulting in harm to workers.
In the pre-cleaning process of the manufacturing procedure, a mixed solution M of sulfuric acid, hydrogen peroxide, and pure water was used, while a mixed solution N of phosphoric acid and hydrochloric acid was used for the marking process.
Although solutions M and N were processed separately, hydrochloric acid gas was generated when solution N was accidentally poured into the poly tank designated for collecting solution M.
The hydrochloric acid gas, which erupted as white smoke from the poly tank, spread into the clean room, causing three workers present in the room to complain of eye pain and seek treatment.
[Recommendation]
■ It is recommended to install equipment that can detect the leakage of toxic gases early and issue alarms.
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