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Chemical
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ハニー化成

EstablishmentDecember 1, 1952
capital10000Ten thousand
number of employees50
addressHyogo/Nagata-ku, Kobe-shi/3-1-33 Hiyoshicho
phone078-691-8282
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last updated:Jun 18, 2025
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ハニー化成 List of Products and Services

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Electrodeposition treatment agent for metals Electrodeposition treatment agent for metals
Photoresist electrocoating agent Photoresist electrocoating agent
Hybrid surface treatment agent Hybrid surface treatment agent
AG coating agent AG coating agent
AR coating agent AR coating agent
AF coating agent AF coating agent
Antistatic treatment agent Antistatic treatment agent
Hydrophilic treatment agent Hydrophilic treatment agent
Technical data Technical data
Photoresist

Photoresist electrocoating agent

Introducing an electrodeposition treatment agent for photoresists.

A negative-type photoresist electroplating agent with excellent chemical resistance, suitable for fine processing.

3D objects can be coated with a thin film mask and etched mask! *Product catalog available.

The "Hani Resist E Series" is a negative-type photoresist electroplating treatment agent developed based on our pioneering electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology). Due to its superior adhesion compared to other electrocoating liquids, it is suitable for plating masks and etching applications, which were previously impossible. 【Features】 ■ Conformability to three-dimensional structures ■ Excellent adhesion ■ High resolution ■ Pinhole-free ■ Chemical resistance *For more details, please refer to the catalog or feel free to contact us.

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Electrodeposition agent for positive photoresist for microfabrication "Hani Resist AP"

Photoresist-type electrocoating paint suitable for fine processing of electronic components and similar applications!

"Hani Resist AP" is a fine processing positive-type resist electrocoating agent developed based on the electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology) that has been cultivated over many years by Honey Kasei and is pioneering in the world. It enables high-speed processing via Reel to Reel for printed circuit boards and COF/TCP (film formation possible in 10 seconds of energization) and allows for fine processing. It also excels in processing capabilities within through-holes, making it easy to form coatings on three-dimensional structures. 【Features】 ■ High-speed processing ■ High resolution ■ Uniform coating thickness ■ Alkaline development, alkaline stripping type *For more details, please refer to the catalog or feel free to contact us.

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What is photoresist? A collection of basic knowledge.

If you want to learn about photoresists, which are essential for semiconductor manufacturing, please take a look!

Our company manufactures and sells electrodeposited resist, but many of our customers are not familiar with photoresist itself. Therefore, we believed there was a need for a basic knowledge page and have created one on photoresist. Some of you may have thought about the following: What exactly is photoresist? I don't really understand the difference between negative and positive types... I can't form a concrete image... If you have such questions, please feel free to download our catalog!! Additionally, we also accept technical inquiries regarding electrodeposited resist, so please contact us through the inquiry form.

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[Developed Product] Negative Type Anionic Electrophoretic Photoresist

It is a negative-type anion electrostatic photoresist!

Since it is an anionic electrophoretic negative-type photoresist, the developer and stripping solution will be alkaline. The developer and stripping solution are not specialized products.

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