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Electronic Components and Semiconductors
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addressTokyo/Hachioji-shi/18-17 Oiwake Town
phone042-627-1812
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last updated:Nov 20, 2018
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Developer cleaning agent "Klinchem 6"

The cleaning time for the drug itself is short, and it is easy to handle, making it possible to easily plan and carry out cleaning!

"Clinkem 6" is a cleaning agent for developing machines that almost completely removes sludge simply by adding the concentrate and operating the machine. Due to its multiple-use capability, there is no need to dispose of waste liquid each time, which helps reduce waste disposal costs and can also lower cleaning running costs. The removal method is not just peeling but involves fine decomposition close to dissolution, so there is no need to remove the nozzle during spray application, allowing simultaneous cleaning of the piping. Additionally, it is less likely for sludge to fall off after cleaning. [Features] - One-component easy operation - Short processing time - Alkaline builder-based active agent decomposition - No sludge fall-off immediately after cleaning due to decomposition cleaning - Significantly improved cleaning power compared to previous agents and methods - Cost benefits from multiple-use capability *For more details, please download the PDF or feel free to contact us.

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Developer Cleaning Agent "Klinchem 5"

The cleaning time for the drug itself is short, and it is easy to handle, making it possible to easily plan and carry out cleaning!

"Clinkem 5" is a developer cleaning agent that removes sludge simply by adding the concentrate and running the machine. Due to its reusability, there is no need to dispose of waste liquid each time, which helps reduce waste disposal costs. Additionally, the running costs of the chemicals can also be minimized. The removal method is not peeling, but rather dissolving and decomposing. Therefore, it is less likely for sludge to fall off after cleaning, and there is no need to remove the nozzle during cleaning, allowing simultaneous cleaning with the piping. 【Features】 - One-component easy operation - Short processing time - No sludge fall-off immediately after cleaning due to dissolving cleaning - Significantly improved cleaning power compared to previous chemicals and methods - Cost benefits from multiple uses *For more details, please download the PDF or feel free to contact us.

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Silicate-based surface impregnation material "Real Maintenance" *NETIS registered

A concrete modifier that suppresses carbonation, freeze damage, salt damage, and alkali-silica reaction with just one application! It allows for a shortened construction process without the need for water curing.

"Real Maintenance" is a surface impregnation agent that is a mixed solution of three types of silicate compounds, used for surface protection methods, surface treatment methods, and surface impregnation methods. It is classified as a reactive silicate-based surface impregnation material, but lithium silicate is also mixed in. With just one application, watering curing is unnecessary. This eliminates the need for watering curing, allowing for a reduction in the construction process. By eliminating the need for treatment of mixed wastewater from the curing agent and water after watering curing, there is no concern about runoff into rivers or oceans. 【Features】 ■ Suppresses concrete carbonation, freeze damage, salt damage, and alkali aggregate reactions ■ No need for watering curing with just one application ■ Shortens the construction process due to the elimination of watering curing ■ No concern about runoff into rivers or oceans ■ NETIS Registration No. KT-080018-VE, a promoted utilization technology *For more details, please refer to the PDF document or feel free to contact us.

  • Coating Agent

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Metal surface treatment agent 'SSP Series' before applying the resist.

Simultaneously achieve surface cleaning and primer treatment! Reduces labor hours.

The "SSP Series" was developed for processing when it is physically difficult to polish inner layers or flexible substrates with machines during the pre-lamination process, and when there is a desire to minimize chemical etching. It is now possible to completely remove chromium, which was previously considered difficult with conventional processing, using a single solution. 【Features】 ■ Removes impurities without significantly etching the copper surface ■ Simultaneously removes oxides, oils, and rust inhibitors ■ Improves resolution by allowing for a smooth treatment of the copper surface ■ Provides sufficient adhesion to the resist due to the primer film ■ Offers simple rust prevention until the next process due to the primer film *For more details, please refer to the PDF materials or feel free to contact us.

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