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アルバック成膜

addressSaitama/Chichibu-shi/Terao 2804
phone0494-24-6511
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Semiconductor integrated circuit "hard mask blanks"

Semiconductor integrated circuits coated with resist for electron beam and laser applications!

"Hard mask blanks" are products that form thin films made of chromium or molybdenum silicide on glass substrates such as quartz or soda-lime, and are coated with photosensitive materials (such as electron beam or laser resists). There are low-reflective chromium mask blanks and halftone phase shift mask blanks, which are used as masks in the manufacturing of LSI as original plates for lithography. [Features] - Forms thin films made of chromium or molybdenum silicide - Coated with photosensitive materials *For more details, please download the PDF or feel free to contact us.

  • Other semiconductors

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