Semiconductor integrated circuits coated with resist for electron beam and laser applications!
"Hard mask blanks" are products that form thin films made of chromium or molybdenum silicide on glass substrates such as quartz or soda-lime, and are coated with photosensitive materials (such as electron beam or laser resists). There are low-reflective chromium mask blanks and halftone phase shift mask blanks, which are used as masks in the manufacturing of LSI as original plates for lithography. [Features] - Forms thin films made of chromium or molybdenum silicide - Coated with photosensitive materials *For more details, please download the PDF or feel free to contact us.
Inquire About This Product
basic information
【Related Products】 ■ Low-reflective chrome film mask blanks ■ Halftone phase shift mask blanks *For more details, please download the PDF or feel free to contact us.*
Price range
Delivery Time
Applications/Examples of results
【Usage】 ■Masks used in the manufacturing of LSI *For more details, please download the PDF or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
ULVAC Coating, Inc. is a group company of ULVAC, Inc., which continues to provide solutions to customers as a comprehensive manufacturer of vacuum technology. We have developed as a leading company in material processing utilizing vacuum technology. Our hard mask blanks for semiconductors and large mask blanks for displays support the remarkable growth in the fields of semiconductors and liquid crystal displays. Please feel free to contact us if you have any inquiries.