ハイブリッジ List of Products and Services

The "HUVS Series" is a turbo molecular pump exhaust system that employs a turbo molecular pump with a high compression ratio (compression ratio of 1×10 to the 11th power). It is available in two types with exhaust speeds of 250 L/sec and 77 L/sec. It comes standard with a full-range vacuum gauge. It is also equipped with a switching function for simultaneous startup of the turbo molecular pump and rotary pump, as well as standalone startup of the rotary pump. 【Features】 ■ Two models available with exhaust speeds of 250 L/sec and 77 L/sec ■ High compression ratio (adopts a turbo molecular pump with a compression ratio of 1×10 to the 11th power) ■ Switching function for simultaneous startup of the turbo molecular pump and rotary pump, and standalone startup of the rotary pump ■ Standard equipped with a full-range vacuum gauge (displayed on the TMP controller) ■ Option to select exhaust pumps from any manufacturer ■ The forevalve is equipped with an automatic leak valve as a countermeasure against backflow during power outages *For more details, please download the PDF or contact us.

• Ventilation and Exhaust

The "HMP-100" is a high vacuum heating micro-prober that can be used at <10^-4 Pa due to its exhaust system. It supports heating temperatures up to 500°C and is compatible with 10mm shaped samples. By adopting a TRIAX connector, it enables electrical measurements below 1 pA. 【Features】 ■ High vacuum specification Usable at <10^-4 Pa due to the exhaust system ■ Heating temperature Supports up to 500°C Compatible with heating 10mm shaped samples ■ Low current measurement Enables electrical measurements below 1 pA by adopting a TRIAX connector *For more details, please refer to the PDF document or feel free to contact us.

• Heating device

The "HFQ-1100" is a high-temperature atmosphere heat treatment furnace capable of heat treatment at high temperatures, with a normal operating temperature of 1100°C (maximum 1150°C). It supports heat treatment under vacuum and gas replacement atmospheres. It is suitable for high-temperature sintering, melting, and gas analysis. The O-ring section features forced air cooling, eliminating the need for a cooling water circulation system. 【Features】 ■ Capable of heating up to 1100°C (maximum 1150°C) ■ Supports heat treatment under vacuum and gas replacement atmospheres ■ The O-ring section features forced air cooling, eliminating the need for a cooling water circulation system ■ Required power: AC100V 2kW (AC200V available as an option) ■ Compact installation space of W540×D420×H568mm *For more details, please refer to the PDF document or feel free to contact us.

• Electric furnace

We offer a range of products including the "Transfer Rod" compatible with ultra-high vacuum (bearing-supported), the compactly designed non-magnetic "Bellows Type Rotary Feedthrough," and the "Magnetic Coupling Type Rotary Feedthrough" suitable for shutter mechanisms. 【Product Lineup】 ■ Transfer Rod "HFTR-300/450/650" - Ultra-high vacuum compatible (bearing-supported) - Rotation prevention mechanism / Remote operation mechanism (optional) ■ Bellows Type Rotary Feedthrough "HBR-34N" - Compact design (outer diameter 45 / total length 126.5mm) - Non-magnetic structure (SUS/AI) ■ Magnetic Coupling Type Rotary Feedthrough "HMR-34N" - Compact design (outer diameter 35 / total length 100mm) for shutter mechanisms - Can be directly connected to a motor as an option *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment

The "HMS2-300" is a 2-inch dual-target sputtering device capable of heating up to 600°C through flat heater heating, allowing for film formation at high temperatures. It supports film formation under vacuum and gas replacement atmospheres. It is equipped with a 2-inch magnetron sputter cathode and can be expanded to a maximum of three targets. Options include an L/L chamber, a movable film thickness gauge, and a bias mechanism. 【Features】 ■ Capable of heating up to 600°C through flat heater heating ■ Supports film formation under vacuum and gas replacement atmospheres ■ Equipped with a 2-inch magnetron sputter cathode (expandable to a maximum of three targets) ■ Options for L/L chamber, movable film thickness gauge, and bias mechanism ■ Compact installation space of W535×D1000×H1800mm *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment

The "TBB-6000" is a controller that supports manual operation via a touch panel and remote operation from an interface. In addition to basic positioning functions, it has expandability, allowing for customization and OEM production based on your requests. 【Features】 ■ For 5-phase stepping motors ■ Microstepping ■ Built-in motor driver ■ Can be stored in a 19-inch rack 【Examples of Customization and System Upgrades】 ▼ Axis expansion: 12 axes, 18 axes, 24 axes ▼ Driver changes: For motors with electromagnetic brakes, high torque large motors ▼ Automatic operation: Start/stop operation via external sensors ▼ Safety mechanisms: Integration of interlocks and safety devices ▼ Linear and rotary stages in a vacuum ▼ Positioning devices for high and low temperature environments *For more details, please refer to the PDF materials or feel free to contact us.

• controller

The "HVE-100" is a compact vacuum deposition device that saves space. The substrate deposition surface is installed facing downward, and the arrangement allows for deposition upwards through evaporation from a resistance heating source (deposition up). It is equipped with a shutter, enabling stable deposition. 【Features】 ■ High vacuum exhaust system: Achieves a vacuum level of <10^-4Pa for clean film formation ■ The chamber is made of SUS for easy maintenance and has internal anti-deposition plates ■ Space-saving/compact: Desktop model with dimensions of W500×D395mm ■ Compatible with your existing exhaust system and film thickness measurement devices *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment
• Evaporation Equipment

It supports a variety of samples and can measure samples up to 10mm in size. The multi-stage radiation shield and three-stage vacuum chamber structure make sample exchange easy. With the push of a button, temperature control can be achieved from room temperature to ultra-low temperatures. (Temperature adjustment requires a temperature sensor and temperature controller [optional].) 【Specifications (excerpt)】 ■ Variable temperature sample stage: 10mm oxygen-free copper stage with screw-type 8 terminal block ■ Cooling mechanism (air-cooled two-stage cryostat) - Stage 1: 3.0W @60K - Stage 2: 0.1W @4.2K ■ Temperature control range: 300K to 4.2K ■ Vacuum chamber: three-stage vacuum chamber *For more details, please refer to the PDF document or feel free to contact us.

• Other measurement, recording and measuring instruments

A lightweight and compact magnetic field generation device capable of generating a magnetic field of 0.5T with a 40mm gap has been adopted. It automatically controls the temperature-dependent measurements of electrical resistance, Hall effect, and thermoelectric properties, calculates electrical resistivity, Hall coefficient, carrier density, etc., and extracts the data to Excel. Additionally, each measurement data is displayed in real-time with numerical values and graphs. 【Features】 ■ Wide range temperature measurement from ultra-low temperature (4.2K) to room temperature (300K) ■ High-power refrigerator that takes about 2.5 hours to cool from the sample set to 4.2K ■ External control of refrigerator, temperature control, and bipolar power supply ■ Automatic simultaneous measurement of electrical resistance, Hall effect, and thermoelectric properties is possible *For more details, please refer to the PDF document or feel free to contact us.

• Other measurement, recording and measuring instruments

Since it uses a non-magnetic heating source, high-temperature heat treatment can be performed in a magnetic field. After heat treatment, it can be moved to a cooling chamber while maintaining the atmosphere, allowing for gas cooling through gas flow. Additionally, it comes with a cooling water circulation system and various interlocks, and as an option, it can be exchanged and installed with heat treatment chambers for outer diameters of 50 and 60. 【Specifications (excerpt)】 <Heat Treatment Chamber/Heating Mechanism> ■ Outer diameter 40 × length 236 mm, water-cooled double SUS316L cylindrical type ■ Achievable pressure: below E-3 Pa ■ Vacuum exhaust/gas introduction: SWG1/4 bellows valve ■ Heating method: Carbon cylindrical heater ■ Sample holder: φ15 × φ12 × 50L quartz crucible *For more details, please refer to the PDF document or feel free to contact us.

• Electric furnace

The "High Vacuum Compatible Gate Valve" features a bellows shaft seal suitable for high vacuum, a lubricant-free mechanism, and a compact design. It offers low vibration and high quality with a variety of options available, all at a reasonable price. 【Specifications (Excerpt)】 ■ Leak Rate - Body (Metal Seal): 2.7×10^-11 Pa·m³/sec - Body (Buna Seal): 2.7×10^-10 Pa·m³/sec - Gate Section: 1.3×10^-9 Pa·m³/sec ■ Usable Vacuum Range: Atmospheric Pressure to 2.7×10^-11 Pa·m³/sec ■ Pressure: 5 Kgf/cm² ■ Mounting Direction: Free *For more details, please refer to the PDF document or feel free to contact us.

• valve

The "HVTB-1100" is a thermal balance device capable of measuring weight changes in metallic materials in an argon gas or vacuum atmosphere. The sample heating device can heat up to 1100°C using an open-type tubular furnace (visual observation during heating is possible through a side quartz window). The vacuum exhaust unit is separate from the oil rotary vacuum pump and turbo molecular pump assembly, allowing it to be connected to other devices for vacuum exhaust. 【Features】 ■ Clean exhaust in the chamber and high vacuum achieved through turbo molecular pump vacuum exhaust ■ Maximum heating temperature of 1100°C, with a regular operating temperature of 1000°C ■ Direct gas introduction into the metal material in the sample crucible through the upper port of the observation chamber ■ Vacuum pressure adjustment range of 10 to 1000 Pa ■ Structure that minimizes temperature drift due to the water-cooled jacket surrounding the balance *For more details, please refer to the PDF document or feel free to contact us.

• Other measurement, recording and measuring instruments