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The "CABL-UH" is an electron beam lithography system that enables finer processing due to reduced forward scattering of electrons within the resist, achieved by adopting a high acceleration voltage. The 130kV acceleration voltage is generated through a single-stage acceleration, resulting in a shorter structure compared to conventional multi-stage accelerated electron guns. This single-stage acceleration design has realized an electron optical system with low aberration and minimal Coulomb blur. Additionally, we offer a lineup of 110kV and 90kV options to suit our customers' applications and budgets. Please feel free to contact us. 【Features】 ■ Adoption of high acceleration voltage ■ Reduced forward scattering of electrons within the resist ■ Capability for finer processing ■ High-resolution drawing possible with high current * You can download the English catalog. * For more details, please refer to the PDF materials or feel free to contact us.

• Other processing machines

This is a model suitable for the production of DFB-LDs (Distributed Feedback Laser Diodes) for communication use. It is a flagship product that adopts a 50kV acceleration voltage, balancing fine processing capability and resist sensitivity. 【Features】 ■ TFE electron gun using single crystal ZrO/W ■ Outstanding beam current stability and beam position stability ■ Achieves a minimum beam diameter of 2nm at an acceleration voltage of 50kV *Drawing demonstrations are available. For more details, please contact us or download the PDF for more information.

• Electron beam lithography equipment