A new structure of the telescope tube has been developed that hardly generates any micro-discharges, achieving stable operation for extended periods.
The "CABL-UH" is an electron beam lithography system that enables finer processing due to reduced forward scattering of electrons within the resist, achieved by adopting a high acceleration voltage. The 130kV acceleration voltage is generated through a single-stage acceleration, resulting in a shorter structure compared to conventional multi-stage accelerated electron guns. This single-stage acceleration design has realized an electron optical system with low aberration and minimal Coulomb blur. Additionally, we offer a lineup of 110kV and 90kV options to suit our customers' applications and budgets. Please feel free to contact us. 【Features】 ■ Adoption of high acceleration voltage ■ Reduced forward scattering of electrons within the resist ■ Capability for finer processing ■ High-resolution drawing possible with high current * You can download the English catalog. * For more details, please refer to the PDF materials or feel free to contact us.
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【Product Details】 ■ Beam diameter: 1.6nmΦ or less ■ Acceleration voltage: 130kV, 110kV, 90kV ■ Stage: Compatible with 8 inches *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Crestec has been a dedicated manufacturer of point beam type equipment for over 20 years, delivering numerous EB lithography systems both domestically and internationally. In addition to selling equipment, we also offer contract processing services for EB lithography. Recently, we have started selling the CABL-UH series of XYZ-type lithography systems, which boasts the world's highest acceleration voltage of 130kV.