Current stability and position stability are top-class in the industry! Electron beam lithography equipment.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.
This is a model suitable for the production of DFB-LDs (Distributed Feedback Laser Diodes) for communication use. It is a flagship product that adopts a 50kV acceleration voltage, balancing fine processing capability and resist sensitivity. 【Features】 ■ TFE electron gun using single crystal ZrO/W ■ Outstanding beam current stability and beam position stability ■ Achieves a minimum beam diameter of 2nm at an acceleration voltage of 50kV *Drawing demonstrations are available. For more details, please contact us or download the PDF for more information.
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basic information
Crestec has been a dedicated manufacturer of point beam type systems for over 20 years, delivering numerous EB lithography systems both domestically and internationally. In addition to selling equipment, we also offer contract processing services for EB lithography. Beam diameter: less than 2nmΦ Minimum line width: less than 10nm Acceleration voltage: 50kV, 30kV Stage: compatible with 4-inch, 6-inch, and 8-inch *For detailed specifications, please contact us or download the PDF to view.
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Crestec has been a dedicated manufacturer of point beam type equipment for over 20 years, delivering numerous EB lithography systems both domestically and internationally. In addition to selling equipment, we also offer contract processing services for EB lithography. Recently, we have started selling the CABL-UH series of XYZ-type lithography systems, which boasts the world's highest acceleration voltage of 130kV.
