List of Semiconductor Manufacturing Equipment products

  • classification:Semiconductor Manufacturing Equipment

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Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.

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  • air conditioning

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[Patent Obtained] Instant complete water removal of workpieces with air blow = complete drying!

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  • Other semiconductor manufacturing equipment

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Revolutionary! No need for water washing! Particles are removed with just air blow.

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  • Other semiconductor manufacturing equipment

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Are you making this mistake when draining water from your work?

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  • Other semiconductor manufacturing equipment

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Are you making this mistake with the work's drainage?

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  • Other semiconductor manufacturing equipment

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Are you making this mistake while draining water from the work?

[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.

No more revolution! No need for washing; particles are removed with just air blowing.

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  • Other semiconductor manufacturing equipment

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Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).

Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.

[Patent Obtained] Complete water removal in an instant with air blow = complete drying!

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  • Other semiconductor manufacturing equipment

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If you see this, you'll understand everything! I created a PR flyer.

100% water removal with air blow! No water droplets left on the workpiece! We have summarized everything about the patented complete drying air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Can it really remove 100% of the water?" "Why is it so effective at removing water?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download it and take a look!

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

It excels in high sensitivity detection, quantification, and portability, making it suitable for quality inspection and research and development settings. It contributes to the detection of minute for...

  • Semiconductor inspection/test equipment
  • Other Sanitation Inspections
  • Other appearance and image inspection equipment

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Visualize surface foreign substances, dirt, and scratches! It is well-received as a daily management tool for yield management, quality control, cleaning management, and hygiene management. *Demo unit...

  • Visual Inspection Equipment
  • Semiconductor inspection/test equipment
  • Defect Inspection Equipment

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High-precision pressure sensor for high-purity fluids.

  • CMP Equipment

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We are not an ordinary valve manufacturer! We can widely produce "unit integrated valves" that combine filters, sensors, and more, tailored to your needs!

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  • Other semiconductor manufacturing equipment

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High-precision pressure gauge for high-purity fluids.

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  • CMP Equipment

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For the pharmaceutical, food, beverage, biotechnology, and cosmetics industries.

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  • Other semiconductor manufacturing equipment

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All-fluoropolymer durable pressure gauge!!

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  • Pressure
  • CMP Equipment
  • Other semiconductor manufacturing equipment

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Minimize the footprint within the device! But with excellent high pressure and flow capacity! Fluororesin valve.

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  • valve
  • Other semiconductor manufacturing equipment

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We propose a solution for pressure relief valves related to semiconductor chemical supply in a new form! It can be selected for a wide range of applications.

  • valve
  • Other semiconductor manufacturing equipment

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GEMÜ stainless steel diaphragm valve for high-purity organic solvents

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  • valve
  • Resist Device

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Custom-made modular type! Easy maintenance and flexible combinations realized by the customer!

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  • valve
  • Other semiconductor manufacturing equipment

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Achieving stable slurry supply! GEMU slurry supply application case for semiconductor manufacturing.

  • valve
  • Other semiconductor manufacturing equipment

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Fluororesin diaphragm valve ideal for abrasive fluids such as slurries.

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  • CMP Equipment

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[Online Exhibition 3/8-3/10] Invitation to Exhibit at the Future of Japanese Manufacturing Exhibition

From March 8 to 10, 2021, we will be exhibiting at the "Future of Japanese Manufacturing" exhibition. Once called a "manufacturing powerhouse," the Japanese manufacturing industry is now facing a crisis due to delays in digital transformation (DX) and other factors, bringing together technologies that will have a significant impact. Mr. Akira Ikegami and Mr. Wang, the chairman of HUAWEI, will also be speakers at the event. This is an opportunity to think together about the "future" of Japanese manufacturing! We look forward to your visit.

Compatible with highly corrosive chemicals!! GEMÜ high-purity fluoropolymer valves

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  • valve
  • Resist Device
  • CMP Equipment

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The "FHR.Star.600-EOSS" is a high-performance magnetron sputtering device developed for precise optical filter film deposition.

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  • Sputtering Equipment

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Highly acclaimed high-precision optical filter deposition magnetron sputtering device

This is a device specialized in optical thin films, such as high-performance optical filters that require multilayering and high reproducibility, particularly for applications like LiDAR, which are expected to see significant demand in the future. It demonstrates strong capabilities for high-quality and stable production. - Film formation that eliminates the influence of film quality changes due to target consumption using a cylindrical cathode. - Stable film formation of oxide films achieved by incorporating a reactive ion source. - Film formation of a wide range of multilayer films enabled by the installation of up to four cathodes.

A high ion current helicon plasma ion source PVD module that achieves directional film formation and enables reactive sputtering.

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  • Sputtering Equipment
  • Plasma Generator

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High-throughput roll-to-roll sputtering equipment for the manufacture of FCCL (Flexible Copper Clad Laminate).

  • Sputtering Equipment

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FHR Star.100-Tetra Co is a very compact sputtering device designed for MEMS and high-performance optical products.

  • Sputtering Equipment

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High-performance, high-quality magnetron sputtering cathodes! Sales, repair, and maintenance services are also available.

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  • Sputtering Equipment
  • Vacuum Equipment
  • Other metal materials

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The Spatakaso Sword Service Center has been established.

Starting in April 2024, we will establish a service center for inspection and repair of the "Magnetron Sputter Cathode" manufactured by Angstrome Science in the United States. The new service center will be equipped with clean room facilities, vacuum leak checkers, and various inspection instruments to ensure comprehensive maintenance. All work will be supervised and guided by qualified personnel who have completed training at Angstrome Science, providing services similar to those in the United States. Until now, we have primarily focused on repairs due to malfunctions, but with the opening of the service center, we will also be able to offer regular maintenance. We will conduct periodic inspections of the cathodes to support operations without downtime.

High-rate and high-quality film formation of dielectric and ferromagnetic materials.

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  • Sputtering Equipment

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We will exhibit at the MEMS Engineer Forum 2025.

The MEMS Engineer Forum is a unique forum operated primarily by engineers among the key players in MEMS technology, which is considered a key technology of the 21st century. At this forum, where MEMS researchers, developers, and engineers from around the world gather, we will introduce and showcase the Remote Plasma Ion Beam Sputtering System manufactured by Plasma Quest Ltd. This is an excellent opportunity to see cutting-edge technologies related to MEMS, not only from our exhibition but also from others. We cordially invite you to attend. Venue: International Fashion Center Hall 1-6-1 Yokogawa, Sumida-ku, Tokyo 130-0015, Japan Access: https://www.tokyo-kfc.co.jp/access/ Exhibited Product: Remote Plasma Ion Beam Sputtering System by Plasma Quest Ltd. https://mono.ipros.com/product/detail/2001148974 https://www.plasmaquest.com/

Production ion beam milling equipment that achieves high rate and high reliability.

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  • Sputtering Equipment

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We achieve film formation by freely controlling reactive sputtering and alloy sputtering.

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  • Sputtering Equipment
  • Plasma Generator
  • Other surface treatment equipment

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We have updated the page for the remote plasma ion beam sputtering system manufactured by PlasmaQuest.

We have updated the page for the Remote Plasma Ion Beam Sputtering System manufactured by PlasmaQuest, which has received positive feedback from various companies since its introduction. We have also included a video on Remote Plasma Target Bias Sputtering. If you have any questions or requests, please feel free to contact us.

Remote source ion beam sputtering device manufacturer for remote plasma sources.

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  • Sputtering Equipment

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Information on commissioned test film formation services (test film formation of high-quality reaction films, etc.)

Research on Co-sputtering of different materials, such as ferromagnetic targets and metal and ceramic targets, which are considered difficult to film using conventional sputtering devices. We strongly support advanced material research and process development, including the deposition of AlScN, which is attracting attention for next-generation MEMS applications. This is a groundbreaking technology that uses a helicon ion source as a plasma source, accelerating high-density ions obtained from it by applying a bias voltage to the target. Since it is an ion beam-type deposition method using a remote plasma system, stable film formation can be achieved even with ferromagnetic and dielectric targets, which are challenging for magnetron sputtering devices. By individually controlling the ion source and target application, it is possible to accommodate a wide range of deposition conditions while also achieving high deposition rates. Independent gas supply near the target and substrate allows for the deposition of various multilayer thin films, including oxide and nitride films. Since the substrate surface is not exposed to plasma, it is possible to maintain a low temperature during film formation.

We will extend the life of your equipment with bolt-on and coupler-on solutions.

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  • Sputtering Equipment
  • Solenoid Actuators
  • Transport and handling robots

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TKC Corporation Nagaoka Service Center Opening: We will achieve one-stop device regeneration and prolongation.

In recent years, we have received numerous requests for extending the lifespan of operational equipment. With the advancement of high functionality in both equipment and components, the specialization of repair services has progressed. Along with this specialization, it has become increasingly difficult to provide comprehensive "repairs" through integrated diagnostics and verification. With the establishment of this service center, we will offer one-stop regeneration and lifespan extension through "comprehensive diagnostics of equipment" by our skilled engineers and the "integration of specialized techniques" from partner engineers located nationwide.

Achieving both high purity and high yield. Contributing to the purification of semiconductor materials.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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High-purity, high-yield sublimation purification equipment that supports thin film production in display manufacturing.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Sublimation purification device for high-purity organic materials that contributes to the improvement of solar cell efficiency.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Achieving both high purity and high yield. Contributing to the improvement of the quality of luminescent materials.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Sublimation purification equipment for improving the quality of spices, featuring high purity and high yield.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Achieving both high purity and high yield. Contributing to the improvement of electronic materials quality.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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High-purity organic material refining device to improve the transparency of optical components.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Achieving both high purity and high yield. Contributing to the improvement of semiconductor material quality.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Achieving both high purity and high yield. Contributing to the improvement of display quality.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Providing high-purity materials that contribute to the reduction of loss in optical fibers.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Contributing to the long lifespan of batteries with high-purity materials.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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Contributes to the improvement of brightness in organic EL with high-purity materials.

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  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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High-purity materials improve the color reproducibility of quantum dots.

  • IPROS60821739067414986019.gif
  • Other semiconductor manufacturing equipment
  • Refining and Extraction Equipment
  • Organic EL

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