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The "Magnetron Sputter Source" is a sputtering cathode for film formation of metals, oxides, semiconductors, and more. Starting with the standard type φ19 compression port cathode, it can be customized to fit existing equipment. We design gas introduction nozzles, shutters, particle mitigation shields (PG shields), and ultra-high vacuum compatibility according to customer needs. 【Features】 ■ For film formation of metals, oxides, semiconductors, etc. ■ Designed to meet customer needs *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationWe offer the vacuum exhaust device 'KST-F08VS-RKS type' equipped with a turbo molecular pump and a rotary pump. With a full-range gauge, it allows for monitoring of vacuum levels from atmospheric pressure to high vacuum without switching. Additionally, its slim design with a width of 270 mm makes it suitable for installation in narrow spaces. It is also easy to move. 【Features】 ■ Allows monitoring of vacuum levels from atmospheric pressure to high vacuum without switching ■ Slim design ■ Can be installed in narrow spaces ■ Easy to move *For more details, please download the PDF or feel free to contact us.
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