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コンタミネーション・コントロール・サービス

EstablishmentJanuary 31, 2000
capital3300Ten thousand
addressKanagawa/Midori-ku, Sagamihara-shi/529-3 Shimojuzawa
phone042-764-3725
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last updated:Aug 03, 2020
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Surface modification of stainless steel "SPP treatment"

A dense chromium oxide film is formed on the surface of SUS316L! Excellent corrosion resistance is achieved against HF and HCl.

The "SPP=Super Passivation Process" forms a dense Cr2O3 film without defects on the surface of stainless steel through surface modification. It achieves excellent corrosion resistance against halogen gases such as hydrofluoric acid and hydrochloric acid, and also improves vacuum characteristics. By modifying the surface of stainless steel, various phenomena that differ from conventional understandings of stainless steel have been elucidated. This technology is also expected to be beneficial in the fields of hydrogen infrastructure and ultra-high vacuum. [Purpose] ■ Corrosion prevention ■ Metal contamination prevention ■ Low gas emission *For more details, please refer to the related link page or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • Surface treatment contract service
  • Processing Contract

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For coating semiconductor manufacturing equipment components such as chambers! Silica coat.

Coating metal with high-purity silica glass! Oxidation is suppressed, and corrosion resistance is improved! Metal contamination is reduced, enhancing product quality and yield in advanced processes!

Quartzace," which has a proven track record in coating semiconductor manufacturing equipment components such as chambers, can accommodate various substrates including metals, resins, rubber, and biological materials. It allows the characteristics of the substrate to be utilized while obtaining the properties of silica glass only on the surface. For example, when coated on metal, it provides excellent corrosion resistance against hydrochloric gas and other substances. Additionally, it can prevent the oxidation of metals at high temperatures. By transforming the metal surface to a synthetic quartz-like SiO2, it can solve the problem of metal contamination. In advanced semiconductor manufacturing processes, even trace amounts of metal contamination can significantly affect product quality and yield. Therefore, coating chambers, surrounding parts, flanges, and other components greatly improves maintenance cycles. 【Overview】 ■Composition: SiO2 ■Film Thickness: 0.1 to 3 μm ■Heat Resistance: 350℃ (-196℃ to 900℃) ■Purpose: Corrosion prevention, metal contamination prevention (excluding F-type gases) *For more details, please download the PDF or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • Surface treatment contract service

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