渕田ナノ技研 List of Products and Services

The aerosol gas deposition (AGD) device is a room-temperature film formation device for ceramics. Fine particles are placed in a sealed container, gas is introduced to generate aerosols, and the lifted particles are transported through a delivery tube and injected onto a substrate from a nozzle. The high-speed injection of frictionally charged ceramic particles during the gas transport process leads to the formation of a dense nanoparticle structured film. 【Typical Device Specifications】 Nozzle width & number: 10mm, 1 piece Substrate drive: 50mm (single-axis drive) Film formation size: 10mm x 50mm *Please feel free to contact us for more details.

• Other physicochemical equipment

We handle a "gas deposition device" in which nanoparticles produced in gas are transported by gas and injected onto a counter substrate from a nozzle. It allows for low-temperature film formation and can be used for the formation of films with active nanoparticles. Please feel free to consult us if you have any requests. 【Example of Device Specifications】 ■ Nanoparticle Production Section - High-frequency induction heating: 5 kW ■ Film Formation Section - Nozzle diameter & number: φ0.3 mm, 1 piece - Substrate drive: X70 mm × Y70 mm × Z40 mm Θ90 degrees ■ Equipped with AGD mechanism *Please feel free to contact us for more details.

• Other physicochemical equipment