We have a large number of GD devices that can form films at low temperatures!
We handle a "gas deposition device" in which nanoparticles produced in gas are transported by gas and injected onto a counter substrate from a nozzle. It allows for low-temperature film formation and can be used for the formation of films with active nanoparticles. Please feel free to consult us if you have any requests. 【Example of Device Specifications】 ■ Nanoparticle Production Section - High-frequency induction heating: 5 kW ■ Film Formation Section - Nozzle diameter & number: φ0.3 mm, 1 piece - Substrate drive: X70 mm × Y70 mm × Z40 mm Θ90 degrees ■ Equipped with AGD mechanism *Please feel free to contact us for more details.
Inquire About This Product
basic information
【Device Specifications Example】 ■ Nanoparticle Production Section ・ High-frequency induction heating: 30 kW ■ Film Formation Section ・ Nozzle diameter & number: φ1mm, 1 piece ・ Substrate drive: X300mm × Y150mm × Z30mm Θ90 degrees ■ Equipped with high-purity He gas recycling system *For more details, please feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please feel free to contact us.
catalog（1）
Download All Catalogs
Company information
Our company has been engaged in the research and development of film formation technology using nozzle spraying of nanoparticles and microparticles for several decades. We focus on the business of aerosol gas deposition devices, gas deposition devices, and nanoparticle-related equipment (including carbon-based), and we manufacture and sell these devices.