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  1. Home
  2. Educational and Research Institutions
  3. 魁半導体
Educational and Research Institutions
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魁半導体

EstablishmentSeptember 2002
capital1000Ten thousand
number of employees10
addressKyoto/Shimogyo-ku, Kyoto-shi/50 Nishijūichijō Gozen Tamachi
phone075-204-9589
  • Official site
last updated:Jun 06, 2018
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  • Company information
  • Products/Services(58)
  • catalog(33)
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魁半導体 Company Profile

Pioneering the future with plasma technology - Kai Semiconductor Co., Ltd.

KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.

Business Activities

- Development and manufacturing sales of various semiconductor manufacturing equipment using plasma, including deposition devices and surface modification devices using liquid sources. - Sales and processing of industrial quartz glass. - Development and manufacturing sales of semiconductor manufacturing equipment through commissioned research. - Deposition outsourcing and etching outsourcing. - Consulting services for semiconductor processes.

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Products/Services (58)

Tabletop Atmospheric Pressure Asher Device SS-50 product image
Tabletop Atmospheric Pressure Asher Device SS-50
Direct-type atmospheric pressure plasma device D300-TB product image
Direct-type atmospheric pressure plasma device D300-TB
Low-temperature pen-type atmospheric pressure plasma device BARRIER-20 product image
Low-temperature pen-type atmospheric pressure plasma device BARRIER-20
Small Vacuum Plasma Device NMR-Gts product image
Small Vacuum Plasma Device NMR-Gts

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catalog(33)

Survey responses are required to view e-book details. Click to view the e-book.

Plasma device "get a command of"

Plasma device "get a command of"

PRODUCT
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Fluidized Bed Atmospheric Pressure Plasma Powder Treatment Device

Fluidized Bed Atmospheric Pressure Plasma Powder Treatment Device

PRODUCT
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Tabletop Powder Dispenser Z03-10

Tabletop Powder Dispenser Z03-10

PRODUCT
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Glass Coating 'Thin Film Formation Technology' at Room Temperature and Atmospheric Pressure [*Technical Documentation*]

Glass Coating 'Thin Film Formation Technology' at Room Temperature and Atmospheric Pressure [*Technical Documentation*]

TECHNICAL
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news(3)

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We have started selling a gas-free atmospheric pressure plasma device.

  • PRODUCT

Plasma treatment can be performed without supplying gas from the outside. It can also be used in surface treatment (pre-treatment for painting, adhesion, printing, etc.) and in the fields of bio and dental medicine. By eliminating the need for gas, we have reduced gas costs and impacts on the human body.

Jun 21, 2016

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Pen-shaped atmospheric pressure plasma device! Surface modification ¥348,000-

  • OTHER

A low-temperature, non-charge-damage atmospheric pressure plasma device that excels in surface modification, cleaning, hydrophilic treatment, and adhesion enhancement! Perfect for fine processing and spot treatment! This pen-type atmospheric pressure plasma device operates at low temperatures without charge damage!! It enables environmentally friendly surface treatment through dry cleaning without solvents♪ Utilizing the high reactivity of plasma, it addresses issues such as enhancing adhesion and bonding to various materials like resin, metal, glass, and fiber, improving hydrophilicity, and removing organic substances! While high-priced plasma devices have been mainstream, the pen-type atmospheric pressure plasma device achieves excellent cost performance by focusing on essential functions. Additionally, by using only nitrogen gas for plasma generation without He or Ar, running costs are significantly reduced! Please check the treatment effects with a free demonstration first. *For treatment videos, search on YOUTUBE for "pen-type atmospheric pressure plasma device."

Sep 28, 2012

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NEW! "Rotating Plasma Device"! Exhibiting at the International Frontier Industry Messe 2012 in Kobe from September 6 to 7. ■ Demo units available at the exhibition booth. Popular for surface modification and cleaning applications.

  • COMPANY

New Product! Rotating Plasma Device Debuts at Trade Show! 【Trade Show Name】International Frontier Industry Messe 2012 【Dates】 September 6 (Thursday) - 7 (Friday), 2012 10:00 - 17:00 【Venue】Kobe International Exhibition Hall, Building 2 (Kobe Port Island) 【Expected Exhibition Scale】 200 booths (including concurrently held events) * FY 2011 results: 239 companies, 271 booths 【Expected Number of Visitors】 15,000 people * FY 2011 results: 17,253 people 【Booth】 Booth Number B-07 Displayed at the booth of 'Kyoto Environmental Nanocluster (Kyoto Institute of Advanced Technology)' 【Presentation】 September 7 (Friday) Presentation Corner A 11:00-11:20 【Exhibition Content】 ☆ Live Demonstration Tabletop Vacuum Plasma Device YHS-R Rotating Vacuum Plasma Device YHS-DOS ■ Sakigake Semiconductor Special Exhibition Page http://www.sakigake-semicon.co.jp/international-industrial-fair2012_plasma.html

Aug 29, 2012

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Detailed information

Company name 魁半導体
number of employees10
Contact addresspostalcode 600-8897 Kyoto/ Shimogyo-ku, Kyoto-shi/ 50 Nishijūichijō Gozen TamachiView on map TEL:075-204-9589 FAX:050-3488-5883
Industry Educational and Research Institutions
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