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  3. 日本ドナルドソン
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Industrial Machinery
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日本ドナルドソン

EstablishmentDecember 21, 1964
capital30070Ten thousand
number of employees300
addressTokyo/Tachikawa-shi/1-8-7 Nishikimachi
phone042-540-4111
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last updated:Jun 06, 2025
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日本ドナルドソン List of Products and Services

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Dust collector Dust collector
Fuel filter Fuel filter
Fuel cell filtration system Fuel cell filtration system
Waterproof breathable filter Waterproof breathable filter
Microfilter (process filter) Microfilter (process filter)
Chemical filter Chemical filter
PTFE membrane Tetratex PTFE membrane Tetratex
Energy-related filter Energy-related filter
Hydraulic and lubrication filter Hydraulic and lubrication filter
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Chemical

Chemical filter

It can be used to achieve the ultra-clean environment required for semiconductor manufacturing and various development experiments and evaluation tests, as well as to prevent performance degradation due to contamination of optical system components.

Chemical Contaminant Removal Filter "Risoguard BSMmax Filter"

A filter that protects wafers and lenses from various pollutants and maximizes their lifespan.

The "Risoguard BSMmax Filter" is a cabinet-type chemical filter that exhibits high removal performance against contaminants such as basic and acidic gases, as well as organic gases in the air. It protects wafers and lenses from contamination by various pollutants, maximizing their lifespan. It is ideal for removing airborne contaminants supplied to semiconductor manufacturing equipment, as well as to facilities and areas that require ultra-clean environments. 【Features】 ■ Usable for the removal of various contaminants - Acidic gases (SO2, HCl, HBr) - Basic gases (NH3, NMP, amines) - Condensable organic gases (HMDSO, TMS) ■ Achieves increased adsorption capacity while maintaining the same size compared to conventional activated carbon filters ■ Filters can be reused through the Refill Program ■ A global sales and service network is in place For more details, please contact us or download the catalog.

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Chemical contaminant removal filter "Risoguard LPS Filter"

Chemical filters that protect lenses from various pollutants and further extend their lifespan.

The "RisoGuard LPS Filter" is a cabinet-type chemical filter that enhances the removal performance of the current class-leading "RisoGuard BSMmax Filter" and achieves further longevity. It protects wafers and lenses from contamination by various pollutants, maximizing their lifespan. It is ideal for removing contaminants from the air supplied to semiconductor manufacturing equipment as well as to facilities and areas that require ultra-clean environments. 【Features】 ■ Usable for the removal of various pollutants - Acidic gases (SO2, HCl, HBr) - Basic gases (NH3, NMP, amines) - Condensable organic gases (HMDSO, TMS) ■ Achieves increased adsorption capacity while maintaining the same size as the RisoGuard BSMmax Filter ■ Can be replaced with the RisoGuard BSMmax Filter ■ Filters can be reused through the Refill Program ■ Global sales and service system For more details, please contact us or download the catalog.

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Chemical filter system "Risoguard 12"

Chemical filter system for high-end semiconductor exposure equipment, such as ArF liquid immersion lithography.

"RisoGuard 12" is a high-efficiency chemical filter system with a HEPA filter developed for high-end semiconductor exposure equipment, including ArF immersion lithography, designed for the removal of acidic, basic, and condensable organic gases. It is equipped with 12 LPS filters or BSMmax filters and 6 HEPA filters within the cabinet. It demonstrates high contaminant removal performance even in low-concentration environments, making it ideal for processes that require a clean environment and for preventing performance degradation due to contamination of optical components. 【Features】 - Long lifespan (equipped with LPS or BSMmax filters) - Space-saving - Low cost (filter recycling through the Refill program) For more details, please download the catalog or contact us.

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Inline chemical filter "Risoguard POU Filter"

It is suitable for filtering compressed air in processes that require a high-purity air environment!

The "RisoGuard POU (Point-Of-Use/Local) Filter" is a piping-connected type chemical filter designed for the removal of contaminants such as basic, acidic, and organic gases. It captures acidic, basic, and organic gases in the passing gas through physical and chemical adsorption. It is suitable for processes that require the supply of higher purity CDA (Clean Dry Air), inert gases, and compressed air, such as semiconductor manufacturing, various development experiments/evaluation tests, and the protection of laser processing machines and optical devices. 【Main Features】 ■ Usable for the removal of contaminants in compressed air, CDA, N2, and other inert gases ■ The filter main body case is made of stainless steel (SUS304) ■ Captures acidic, basic, and organic gases in the passing gas through physical and chemical adsorption ■ Has high particle removal capabilities in addition to the removal of gaseous contaminants For more details, please refer to the downloadable catalog (English version) or contact us.

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