アナリティクイエナジャパン Product Lineup

Thanks to its unique instrument design and stable plasma flame, the PlasmaQuant 9200 series offers not only the highest resolution and best detection limits for any sample type, but also the smallest instrument footprint. In combination with unmatched reliability and easy handling, Analytik Jena's new ICP-OES instrument will be the key for your successful labwork. 【Features】 - Unmatched resolution, best detection limits, long-term stability, and a wide spectral range - Flexible plasma view and up to 1,700W plasma output - Reduces laboratory space by over 40% compared to conventional ICP-OES - Device startup time is within 10 minutes An optical emission spectrophotometer that is designed for those who expect nothing less than the highest precision, reliability and sensitivity. Whether it is cutting edge research, finding every trace in quality control, or anything in between. The PlasmaQuant 9200 series is at your side. ●Analytical Excellence The PlasmaQuant 9200 series combines market-leading resolution with unsurpassed matrix tolerance – that way, your results meet the highest analytical standards. - With unparalleled resolution of 2 pm @ 200 nm, the peak is always in plain sight - Best detection limits with long-term stability for reliable results - Adapt to any challenge with the most extensive spectral range available – 160 to 900 nm for ultimate versatility ●Space-Saving Powerhouse Quick instrument start-up, robust plasma and the smallest footprint on the market – with the PlasmaQuant 9200 series you not only save time and money, but also valuable lab space. - We reduced the instrument size by more than 40 percent, making the PlasmaQuant 9200 the smallest instrument in its class, with only 60 cm width - Master any matrix with up to 1,700 Watt of plasma power - Save time and resources with quick boot-up time of less than 10 minutes ●Simply Reliable Effortless handling, easy consumable replacement, and long-term reliability. The PlasmaQuant 9200 series ensures carefree use, application safety, and full flexibility. - Mix and match your torch – Depending on your samples, use the material that fits best, with our completely modular solution - The Dual View PLUS allows to measure each sample with the optimum plasma observation modes to avoid repetitive sample measurements - With a tailor-made service contract, you are always on the safe side, be it for regular maintenance for more sustainability or quick help when you need it

In the metal industry, accurate composition analysis of metal materials is essential for product quality control and performance improvement. In particular, the composition ratios of alloys and the detection of impurities significantly affect the strength and corrosion resistance of products. Inadequate composition analysis can lead to a decline in product quality or accidents. The PlasmaQuant 9200 series enables accurate composition analysis of metal materials with unparalleled resolution and the best detection limits, supporting your quality management. 【Usage Scenarios】 - Quality control of metal materials - Analysis of alloy composition - Impurity analysis 【Benefits of Implementation】 - Quality improvement through accurate composition analysis - Reduction of defective products - Gaining customer trust

In the field of materials science, compositional analysis is essential for property evaluation. Particularly in the development of new materials and quality control, accurate quantitative analysis of trace elements is required. Inaccurate analysis results can lead to incorrect assessments of material performance, resulting in delays in development and quality issues. The PlasmaQuant 9200 series accurately performs trace element analysis of materials with high resolution and detection limits, supporting research and development as well as quality control. 【Application Scenarios】 - Compositional analysis of metal materials - Impurity analysis of ceramics - Additive analysis of polymer materials 【Benefits of Implementation】 - Accurate understanding of material properties through high-precision analysis - Increased efficiency in research and development and improved quality control - Promotion of problem-solving through rapid analysis