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By replacing the conventional "process of substituting with liquefied carbon dioxide" with the "process of substituting with supercritical carbon dioxide"... ● By preheating the liquefied carbon dioxide pumped into the chamber, it is introduced as a low-viscosity supercritical fluid, allowing for cleaning and drying with minimal damage to nanometer-level fine structures. ● The absence of temperature cycles for cooling and heating the chamber enables cleaning and drying at a constant temperature, which allows for a reduction in processing time. ● By programmatically controlling the heater, automatic pressure adjustment valve, and pump, efficient depressurization from the rinsing liquid using supercritical fluid to atmospheric pressure can be achieved without creating a closed system.

• Other semiconductor manufacturing equipment