Alaina - Company Ranking(14 companies in total)
Last Updated: Aggregation Period:May 06, 2026〜Jun 02, 2026
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Features】 ○ Standard mask aligners for 4/6/8 inches ○ Compact standard machine for fine exposure ○ Exposure equipment capable of high-resol... | For more details, please contact us or refer to the catalog. | ||
Mask aligner
Other |
Contact-type equal magnification pattern exposure device. A device that exposes patterns on silicon wafers and other materials using ultravi... | It is used for the manufacturing and research of various semiconductor products such as sensors, power-related components, LEDs, and communi... | |
| 【Features】 ○ A mask aligner with sufficient functionality for photolithography at a low cost ○ Fully manual machine → Usable for various exp... | For more details, please contact us or refer to the catalog. | ||
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- Featured Products
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High-Performance Mask Aligner LA Series
- overview
- 【Features】 ○ Standard mask aligners for 4/6/8 inches ○ Compact standard machine for fine exposure ○ Exposure equipment capable of high-resol...
- Application/Performance example
- For more details, please contact us or refer to the catalog.
Mask aligner
- overview
- Contact-type equal magnification pattern exposure device. A device that exposes patterns on silicon wafers and other materials using ultravi...
- Application/Performance example
- It is used for the manufacturing and research of various semiconductor products such as sensors, power-related components, LEDs, and communi...
Experimental/Research Mask Aligner ES410
- overview
- 【Features】 ○ A mask aligner with sufficient functionality for photolithography at a low cost ○ Fully manual machine → Usable for various exp...
- Application/Performance example
- For more details, please contact us or refer to the catalog.
-
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