Thin Film Coating - Company Ranking(3 companyies in total)
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| Company Name | Featured Products | ||
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| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| Introducing Photoprecision Co., Ltd., which contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as a core technology. We can coat most metals and metal oxides! ■□■ Features ■□■ ■ We have in-house resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering equipment. ■ Resistance heating vacuum deposition A deposition method that heats and evaporates thin film materials (targets) in a vacuum and deposits them onto the substrate surface. ■ E.B. heating vacuum deposition A deposition method that heats and evaporates the target in a vacuum and deposits it onto the substrate surface. ■ Sputtering A film formation method where argon positive ions impact the target, and the atoms ejected by the impact arrive at the substrate surface to form a film. ■ Please feel free to inquire about other types of films, film thicknesses, and multilayer films. We can accommodate a wide range of substrate types and sizes. | For more details, please download the catalog or contact us. | ||
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フォトプレシジョン
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- Featured Products
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Thin film coating compatible with metals, metal oxides, and dielectric films.
- overview
- Introducing Photoprecision Co., Ltd., which contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as a core technology. We can coat most metals and metal oxides! ■□■ Features ■□■ ■ We have in-house resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering equipment. ■ Resistance heating vacuum deposition A deposition method that heats and evaporates thin film materials (targets) in a vacuum and deposits them onto the substrate surface. ■ E.B. heating vacuum deposition A deposition method that heats and evaporates the target in a vacuum and deposits it onto the substrate surface. ■ Sputtering A film formation method where argon positive ions impact the target, and the atoms ejected by the impact arrive at the substrate surface to form a film. ■ Please feel free to inquire about other types of films, film thicknesses, and multilayer films. We can accommodate a wide range of substrate types and sizes.
- Application/Performance example
- For more details, please download the catalog or contact us.
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フォトプレシジョン
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