Analysis Seminar "RBS, D-SIMS"

RBS (Rutherford Backscattering Spectrometry) is a method for analyzing the composition of thin films on solid surfaces, characterized by its non-destructive nature and the absence of a need for standard samples for quantitative analysis. In this course, we will clearly explain the analytical method, points of caution, and more. Furthermore, we will also introduce related techniques that use high-energy ions, such as hydrogen analysis (HFS) and nuclear reaction analysis (NRA), including their applications. By delving into the measurement principles and analysis methods, we aim to provide a unified understanding of the content and help participants acquire practical knowledge for on-site application.
SIMS (Secondary Ion Mass Spectrometry) is the most sensitive method among surface analysis techniques and is optimal for depth profiling of impurities in various solid materials, including semiconductors. It has a long history of use in both industrial and research applications. However, the quality of the data can vary significantly based on the measurement conditions, making it a technique that requires expertise. In this course, we will explain the fundamental aspects of Dynamic-SIMS, including its principles, characteristics, effectiveness, and the workings of the equipment, as well as specific methods for obtaining high-quality data, such as addressing sensitivity changes, optimizing depth resolution, and reducing background (residual components within the equipment).

Date and time | Thursday, Oct 23, 2025 01:00 PM ~ 04:00 PM |
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Entry fee | Charge 44,000 yen |
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Details & Registration