【Technical Information】Components of CMP Slurry

I will explain the components of CMP slurry.
Currently, many slurries used in the CMP process have the following composition:
1) Abrasives:
They enhance processing efficiency through mechanical action. Some also exhibit chemical action.
2) Chemicals and additives:
They enhance processing efficiency through chemical action and provide special functions or performance. They have various functions such as surface modification of the workpiece, prevention of re-adhesion of impurities, and improvement of cleaning properties.
3) Dispersion medium:
It evenly disperses the abrasive components and mediates mechanical and chemical actions. Currently, almost pure water is used. It serves roles such as cooling, transporting abrasives, discharging residues, and lubrication.
We optimally select abrasives and additives according to each application, ensuring the stability of the slurry itself and maximizing performance up to the customer.
Next time, I will explain "abrasives," one of the components.

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Introduction page for Nitta Haas products, including CMP slurry