It is a wet exhaust treatment system for the etching process.
This device is a wet scrubbing system for the etching process. It can remove target gases such as Cl2, HBr, BCl3, HCl, HF, SiF4, etc., to levels below the TLV values, which conventional wet scrubbing could not achieve. 【Features】 - The adsorption tube is regenerated with water, resulting in a long cartridge lifespan. - Only water is used, eliminating alkaline contamination. - The low water usage reduces running costs. - The structure minimizes clogging at the gas-liquid contact area. - Continuous scrubbing is possible due to the automatic alternating operation of the adsorption tubes. *For more details, please refer to the PDF document or feel free to contact us.
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