For research and development! For prototyping! For experiments! Please make use of our processing technology.
Our "Patterning Processing" offers contract foundry services that assist in processing various processes on 8 and 12-inch device lines, MEMS device lines, and prototype lines for devices under 6 inches. For semiconductor elements, MEMS structures, plating, and etching (Deep-RIE, Dry & Wet), we can perform exposure and development using aligners, steppers, and electron beam lithography as methods for resist patterning. Additionally, we possess various types of resists for positive, negative, dry film, thin film, and thick film, and we are also capable of patterning polyimide. [Typical Processing Processes] ■ Sputtering ■ Evaporation ■ CVD ■ CMP Polishing ■ Deep-RIE & ICP, etc. *For more details, please refer to the PDF document or feel free to contact us.
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