This single device can achieve the generation of long-length powder CNTs, the growth of vertically oriented CNTs on substrates, and the deposition of carbon films on powder sample surfaces.
Optionally, by adding introduction units for ammonia gas and other CVD gases, as well as introduction units for solid or liquid precursors for CVD reactions, it is also possible to perform nitriding treatment and film formation of chalcogenide layered materials.
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basic information
【Features】 ○ Capable of operating in both vacuum CVD mode and atmospheric pressure CVD mode. ○ Standard equipped with a mass flow gas introduction system. ○ CVD process recipes for nano-carbon generation are disclosed. ● For other functions and details, please contact us.
Price information
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Price range
P6
Delivery Time
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Applications/Examples of results
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Company information
In the fields of carbon nanotubes, nanomaterials, and nanotechnology, we are continuously advancing our research and development to keep pace with changing market needs and to aim for the forefront of technology. Additionally, we are making ongoing efforts to acquire a wide range of knowledge and capabilities to meet the diverse needs of the market. We always strive to fully understand our customers' objectives and requests, and to proactively propose the shortest path to achieving their goals. We are committed not only to utilizing the strengths we have accumulated but also to gaining new insights and capabilities through challenges as we engage in our work. The advancements in nanotechnology have led to numerous innovations. The wonders and allure of the nanoscale still hold many deep mysteries. We also wish to contribute to the progress of nanotechnology and the creation of innovations.