Complete integration of hydrophilic treatment, deposition equipment, and ion sputtering functions.
The multi-film deposition device VES-10 is a compact tabletop unit that fully integrates hydrophilic treatment, deposition, and ion sputtering functions. It deposits replacement leads for mechanical pencils. It uses a magnetron target for low-damage sputtering. The operations for ion sputtering and hydrophilic treatment are fully automated, allowing for automatic execution from the start of evacuation to the end of coating. Function switching is easy with just one button. For more details, please contact us or refer to the catalog.
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basic information
【Main Features】 - Uses replacement leads for mechanical pencils for deposition. Low damage sputtering with a magnetron target. - Easy hydrophilic treatment for hydrophobic samples. - Standard target metal is gold-palladium. - Exhaust system is a floor-mounted rotary pump. - Ion sputtering and hydrophilic treatment operations are fully automated. → Can be performed automatically from the start of exhaust to the end of coating. - Function switching is easy with just one button. 【Other Features】 - This device is a multipurpose, easy-to-operate carbon deposition, magnetron sputtering, and hydrophilic treatment system with two sample processing chambers. - Exhaust is provided by a floor-mounted rotary pump (with 1m hose) and includes an auto-leak function. - It has the functions of three models: VC-100S, MSP-1S, and PIB-10 in one unit. - Designed to be compact, space-saving, multifunctional, and easy to operate, making it beginner-friendly. - Carbon deposition uses replacement leads for mechanical pencils with three selectable fixed voltages. - Magnetron sputtering and hydrophilic treatment are fully automated, requiring only timer adjustments for operation. ● For more details, please contact us or refer to the catalog.
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Price range
P5
Delivery Time
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Applications/Examples of results
【Usage】 ○ A compact tabletop device that fully integrates hydrophilic treatment, deposition, and ion sputtering functions. ● For more details, please contact us or refer to the catalog.
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Company information
We manufacture sputtering devices, deposition devices, plasma irradiation devices, CVD devices, and vacuum components. We offer a lineup of pre-treatment devices for electron microscope sample preparation and small vacuum devices for research and development institutions. We believe it is our company's mission to quickly and affordably supply the necessary equipment development for those active in cutting-edge technology research and development, and to support development by making incremental improvements and modifications during the experimental process. We are involved in the development, commercialization, sales, and service of experimental instruments and devices necessary for new technology development in the fields of semiconductors, biotechnology, environment, and nanotechnology, as well as devices related to electron microscope sample preparation as cutting-edge analytical tools for new technology development.
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