Industry first! Real-time analysis of plasma background! Also applicable as an endpoint monitor. Amazingly low-priced OES software.
Achieved through joint development with Osaka University! This is the industry's first system that analyzes background using continuous spectra of plasma in real-time. As a result, it is now possible to monitor molecular fluctuations in real-time and estimate electron temperature faster than with probe methods. Target molecules can be freely set, allowing applications not only in plasma but also across a wide range of fields. It also includes functionality as an endpoint monitor, making it usable in manufacturing environments. The spectrometer and software set can be introduced at a very affordable price.
Inquire About This Product
basic information
**Features** - Real-time analysis of background using continuous spectrum of plasma - Real-time analysis of molecular emission intensity - Real-time analysis of molecular ratios From spectroscopic measurement data, we analyze and graphically display the background, molecular emission intensity, and molecular emission ratios in real-time. We analyze the background from the overall emission intensity using the continuous spectrum, and from that, we determine the emission intensity of the target molecule's line spectrum. Additionally, by real-time analysis of the emission intensity ratio of two types of molecules, it aids in controlling the gas phase state in plasma CVD furnaces and similar applications. ◎ Feedback control to the equipment is also possible through customization. - For more details, please refer to the catalog.
Price information
Prices may vary depending on the features. Please feel free to contact us.
Delivery Time
※Delivery dates may vary depending on functionality. Please feel free to contact us.
Applications/Examples of results
【Purpose】 Monitoring of plasma CVD furnaces Etching Sputtering Sterilization monitoring in medical and food applications Other endpoint monitoring
catalog（2）
Download All Catalogs
![Plasma Emission Monitoring Software [English Version]](https://image.mono.ipros.com/public/catalog/image_generated/01/12a/227453/227453_IPROS3971458428778791156_1.jpg?w=120&h=170)
News about this product（1）
Company information
Based on our extensive experience in device control, production line monitoring, and the development of analysis and measurement systems, we are engaged in software development for solar cell characteristic evaluation measurements, EL image analysis, surface analysis, plasma emission monitoring, and more. We have expertise in evaluation for solar cells, allowing us to propose optimal systems for new entrants in the industry. Additionally, our spectral analysis software can be applied across various fields, including semiconductors, medical, and food industries. We are flexible in accommodating customizations, so please feel free to consult with us. Our clients include major manufacturers both domestically and internationally, public research institutions, and government agencies, and we have received feedback from users stating that our software is "the easiest to use so far." We have also succeeded in systematizing analyses that were deemed "impossible to systematize," excelling in high-difficulty analysis and calculations, with proven results in high-precision and high-speed measurements for the aerospace industry, as well as defense applications. We are also actively responsive to bundled software for devices, tie-up sales, and collaborative development with research institutions.