Metal Filter Regeneration Cleaning Device MA-1000
MA-1000 Metal Filter Regeneration Cleaning Device
A cleaning machine designed for the regeneration and cleaning of SUS-made filters. It removes dirt through internal and external pressure, allowing the filters to be reused as regenerated filters.
It features a compact and cost-effective design. Cleaning nozzles are installed on both the inside and outside to completely remove dirt. The workpiece is set on the work table, which rotates and is pressure washed from the inside. The water drainage of the filter is achieved by blowing high-pressure air from the cleaning nozzles through the switching of the solenoid valve. An ultrasonic cleaning tank is also available as an option.
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basic information
【Main Features】 ○ It has a compact and cost-effective design. ○ Cleaning nozzles are installed on both the inside and outside to completely remove dirt. ○ The workpiece is set on the work table, which rotates and is cleaned with pressurized water from the inside. ○ The water drainage of the filter is achieved by blowing high-pressure air from the cleaning nozzles through the switching of the solenoid valve. ○ An ultrasonic cleaning tank is also available as an option.
Price range
P5
Delivery Time
※Two months after the order is received.
Applications/Examples of results
Regeneration cleaning device for metal filters
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Company information
July 2009: Received certification for a research and development plan related to the advancement of manufacturing infrastructure technology for small and medium-sized enterprises from the Ministry of Economy, Trade and Industry. June 2010: Began joint development with the National Institute of Advanced Industrial Science and Technology on glass etching for solar cells. February 2011: Ordered and received an 8-inch chemical cleaning system for the 3D semiconductor research center. July 2011: Contracted by Saitama Prefecture for the next-generation industry entry support project. November 2011: Developed an alkaline spin etching system. Specifications: For large substrates (300 mm square). February 2012: Completion of the next-generation industry entry support project in Saitama Prefecture. April 2012: Newly developed silicon wafer separator for solar cells.