This explains the application of sputtering to currently popular touch panel-related materials, focusing on the basics and troubleshooting!
**Lecturer** Professor Akira Iwamori, Department of Mechanical Engineering, Faculty of Engineering, Tokai University **Target Audience**: Engineers, researchers, personnel, and beginners interested in sputtering and plastic film formation **Venue**: Tokyo Chuo Ward Industrial Hall, 4th Floor, Meeting Room 4 [Tokyo, Nihonbashi] 5 minutes from B4 exit via underground passage from Bakuroyokoyama Station on the Toei Shinjuku Line (Directions 2) 5 minutes from C1 exit via East ticket gate from Bakurocho Station on the JR Sobu Rapid Line (Directions 3) and others **Date and Time**: October 26, 2011 (Wednesday) 13:30-16:30 **Capacity**: 30 people *Registration will close once full. Please apply early. **Participation Fee**: **[Early Bird Discount Price]** 46,200 yen (tax included, including text costs) for up to 2 people from one company *Limited to Tech-Zone members who apply by October 12. Membership registration is free. *After October 12, the **[Regular Price]** will be 49,350 yen (tax included, including text costs) for up to 2 people from one company.
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basic information
**Lecture Summary** Thin films formed on plastic films by physical vapor deposition (PVD) methods such as sputtering significantly enhance the properties of the underlying plastic films. This presentation will clearly introduce the technology for forming metal, inorganic, and organic thin films on plastic films to improve various functions and characteristics, from the basics to applications. In particular, for metal thin films, we will discuss metal deposition films with excellent adhesion and ductility; for inorganic thin films, the formation of transparent electrodes and gas barrier films; and for organic thin films, applications such as anti-reflective coatings. We will also cover the mechanisms of functional expression of these thin films, as well as the surface modification of plastic films and low-temperature film formation technologies, including applications related to deposition speed and in-plane uniformity of film thickness.
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P2
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Applications/Examples of results
1. Fundamentals of Thin Film Formation Technology 1-4 Types of Sputtering and Their Characteristics 2. Metal Thin Films Formed on Plastic Films 2-1 Metal Thin Films Formed on Polyimide Films by Sputtering 2-1-2 Stability of Adhesion Strength of Copper Thin Films by Heating and Prevention of Adhesion Strength Decrease 2-2 Metal Thin Films Formed on Polyester (PET) Film Substrates by Vacuum Deposition 2-2-1 Tensile Properties and Adhesion of Metal Thin Films 2-2-2 Formability of Alloy Thin Films Formed by Dual Source Vacuum Deposition on Polyester Films 3. Inorganic Thin Films Formed on Plastic Films 3-1 Transparent Conductive Thin Films (ITO Thin Films) Formed by Sputtering 3-2 Gas Barrier Properties of Silicon Oxide-Based Thin Films Formed by Reactive Sputtering 4. Organic Thin Films Formed on Plastic Films 4-1 Properties of Fluorine-Based Organic Thin Films Formed by High-Frequency Sputtering 4-2 High-Speed Film Formation and In-Plane Uniformity of Thickness Using Magnetic Fields 4-3 Applications to Anti-Reflective Coatings 5. Surface Modification and Microfabrication Technology of Plastic Films 6. Applications of Thin Films Formed by Sputtering in Sensors
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