Know-how for anti-reflective processing of optical materials such as optical lenses and optical films, which require high-precision technology, using nanoimprint!
Speaker Part 1: Aitrix Co., Ltd. Representative Part 2: Tokyo Metropolitan University Graduate School of Urban Environmental Sciences, Department of Molecular Applied Chemistry, Assistant Professor, Ph.D. (Engineering) Takashi Yanagishita Part 3: Tokyo University of Science, Faculty of Engineering, Department of Electronic Applied Engineering, Associate Professor Jun Taniguchi Target Audience: Researchers and representatives interested in microfabrication, nanoimprint, and optical materials Venue: Tokyo Chuo Ward Industrial Hall, 4th Floor, Meeting Room 4 [Tokyo, Nihonbashi] Access: - Toei Shinjuku Line, Bakuroyokoyama Station, via underground passage, 5 minutes from Exit B4 (Directions 2) - JR Sobu Rapid Line, Bakurocho Station, via East Exit ticket gate, 5 minutes from Exit C1 (Directions 3), etc. Date and Time: December 21, 2011 (Wednesday) 11:00 AM - 4:00 PM Capacity: 20 people *Please apply early as there may be a rush of applications. Participation Fee: [Early Bird Discount Price] 51,450 yen (tax included, includes lunch and text costs) for up to 2 people from one company. *Limited to Tech-Zone members who apply by December 7. Membership registration is free. *After December 7, the [Regular Price] will be 54,600 yen (tax included, includes text costs) for up to 2 people from one company.
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basic information
【2 Lecture Summary】 We will introduce our recent research results on the fabrication of anodic aluminum oxide, which is a nano-hole array structure with uniformly sized pores arranged in a regular pattern, its application to molds for nanoimprinting, and the application of nano-structured polymers and inorganic materials produced through the nanoimprinting process to photonic functional devices. 【3 Lecture Summary】 Nanoimprint technology has become capable of transferring not only to resins but also to metals, enabling applications in areas such as printed electronics. However, a problem that arises is the adhesion of resins and other materials to the mold during demolding. This lecture will outline the troubles encountered during demolding and evaluation methods, and will present solutions.
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P2
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P2
Applications/Examples of results
**Program** 1. Formation of Highly Ordered Porous Alumina 1-1 Formation of Highly Ordered Porous Alumina via Self-Organization Process 1-2 Fabrication of Ideally Arranged Porous Alumina Based on Texturing Process 2. Fabrication of Nanoimprint Molds Using Highly Ordered Porous Alumina 2-1 Fabrication of Porous Alumina Molds 2-2 Fabrication of Metal Molds via Plating Process 3. Formation of Nano-Ordered Structures via Nanoimprint Using Highly Ordered Porous Alumina 3-1 Formation of Polymer Nano Structures 3-2 Formation of Nano Structures Composed of Inorganic Materials 3-3 Formation of Nano Structures on Curved Surfaces 3-4 Continuous Shaping Using Roll Molds 4. Fabrication of Optoelectronic Devices via Nanoimprint Process 4-1 Fabrication and Evaluation of Photonic Crystals 4-2 Fabrication and Evaluation of Anti-Reflection Structures 4-3 Optimization of Anti-Reflection Properties Associated with Structural Control
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