Surface charge analysis device
The surface charge analysis device is ideal for monitoring contamination and damage that occur during processes such as semiconductor front-end management, particularly thermal oxidation films, CVD film formation, metallization, cleaning, and etching.
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basic information
Measurement of Wafer Surface Charge Density and Interface State Density ■ Oxide Film Process ・Changes in charge density in the oxide film due to wafer contamination and plasma damage ・Changes in interface state density due to thermal stress, etc. ・Monitoring of fixed charge in the nitride oxide film ■ Cleaning Process Management ・Charge density check of the surface state after wafer cleaning ■ CVD Process Management ・Check of trap charge states in the film
Price information
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Delivery Time
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Applications/Examples of results
■Non-destructive Real-time Process Monitor - Measurement possible immediately after process management - No electrode formation required - Reusable monitor wafer - High-speed measurement → < 1 point/min - Easy operation
Company information
Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.
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