Rental and contract processing of plasma equipment (surface modification, etching, film deposition)
Free demo available now! We offer rental and contract processing of various plasma devices (from 7 days). Reduce development costs! Supporting research and development with plasma technology!
We respond to various needs such as rental, contract processing, research, and development of various plasma devices that excel in surface modification (cleaning, surface modification, hydrophilization, adhesion enhancement), etching, and film formation. Plasma surface treatment is gaining attention as a next-generation surface treatment technology that imparts unique characteristics to the surface of materials, enhancing product functionality and adding high value, with applications across a wide range of fields (from electronics to medical and biotechnology). Since our founding, Kai Semiconductor has been rapidly supporting research, development, experimentation, and prototyping of plasma technology based on our accumulated knowledge, achieving cost reductions in development! 【Service Details】 ◇ Rental of various plasma devices - We offer rental from as short as one week to long-term rentals of over a month. - If installation or handling instructions are needed, we will visit (additional costs apply). - Please consult us about rental of peripheral equipment as well. ◇ Plasma contract processing - We accept various plasma contract processing requests. - We will create accurate reports using our in-house equipment. Please feel free to consult us regarding service details and more. We are currently offering demo processing free of charge. *For details on pricing, please download the catalog.
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basic information
Founded as a venture company originating from Kyoto Institute of Technology, the domestic manufacturer of plasma devices, "Kai Semiconductor," received the "Kansai Front Runner Award" and the "Kyoto Small and Medium Enterprises Excellent Technology Award" last year. Our in-house engineers respond to various needs. ☆Benefits - Reduction of development costs - Implementation of speedy research and development - Capability to handle small lot production - Ideal for short-term spot utilization and research - Capability to handle regular and large lot production - Utilization of well-equipped in-house facilities (clean room, contact angle meter, step gauge, force gauge, hygrometer, thermometer, etc.) to produce accurate reports. - Processing tailored to your requests 【Product Lineup】 - Various atmospheric pressure plasma devices (surface modification) - Various vacuum plasma devices (surface modification, etching, film deposition) - Powder plasma devices - UV devices, etc. We also accept the development of products tailored to your requests.
Price range
P3
Delivery Time
P2
Applications/Examples of results
【Surface Modification】 ☆Content - Surface modification / Dry cleaning / Improvement of hydrophilicity / Enhancement of adhesion effects / Pre-treatment for printing and painting / Removal of organic substances / Improvement of wettability / Cell culture, etc... ☆Materials Metals, glass, resins, powders, tubes, etc. 【Etching】 ☆Content - Contract processing of dry etching (silicon, glass, metal) 【Film Formation】 ☆Content - Formation of SiO2 films and TEOS films 【Examples】 ☆Content - Cleaning of glass and pre-treatment for adhesion - Cleaning of LSI and pre-treatment for adhesion - Cleaning of resin molded products and pre-treatment for adhesion - Substrate cleaning for solar cells and fuel cells - Terminal cleaning for organic EL, digital signage-related displays, and LCD substrates - Pre-treatment for wire bonding - Cleaning of films and pre-treatment for adhesion - Cleaning of MEMS, etc. - Pre-cleaning before plating - Pre-treatment for printing on paper - Cleaning of semiconductor wafers - Cleaning of silicon wafers, etc...
Detailed information
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Effect of wettability of each material In plasma devices, surface treatment is possible for various materials such as resins, metals, glass, and fibers. The image below shows the improvement in hydrophilicity before and after treatment.
Line up（5）
| Model number | overview |
|---|---|
| Tabletop Vacuum Plasma Device YHS-R | A tabletop vacuum plasma device specialized for surface modification! It features easy one-touch operation and is priced affordably. |
| Atmospheric Pressure Plasma S5000-BM | An atmospheric pressure plasma device that operates at low temperatures with minimal charge damage. |
| Tubular Inner Wall Plasma S5000-T | With unique technology from Kai Semiconductor, plasma treatment is possible on the inner walls of tubes! |
| Powder Plasma Device PPU-800 | An atmospheric pressure plasma device suitable for surface modification of powders. |
| Surface-type Atmospheric Pressure Plasma | The world's first device capable of generating atmospheric pressure plasma in a surface shape, commercialized from the technology invented by Professor Sakai of Kyoto University. |
catalog（1）
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Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.