Experimental/Research Mask Aligner ES410

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last updated：Sep 24, 2012

ナノテック

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A mask aligner with sufficient functionality for photolithography at a low cost.

The ES410 mask aligner for experiments and research is a low-cost device that possesses sufficient functions necessary for photolithography. It is a fully manual machine suitable for various experiments, research, and learning about photolithography. With the wide customization options unique to the ES series, it can be set up to better fit specific purposes by selecting various units and options. Most units can be added or changed later, allowing for future upgrades. For more details, please contact us or refer to the catalog.

Related Link - http://www.nanotech-inc.co.jp/index.html

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【Features】 ○ A mask aligner with sufficient functionality for photolithography at a low cost ○ Fully manual machine → Usable for various experiments, research, and learning photolithography ○ Wide customization options unique to the ES series ○ Various units and options can be selected ○ Can be set up to fit specific purposes ○ Most units can be added or changed later → Supports future upgrades 【Specifications】 ○ Type: 1:1 single-sided exposure mask alignment device ○ Exposure method: 1:1 exposure, contact and proximity ○ Compatible samples: Up to φ4 inches, thickness within 3mm → Can accommodate various sizes by changing the sample stage ○ Fixing method: Vacuum suction ○ Compatible masks: Up to 5 inches square, thickness of 0.06 or 0.09 inches → Can accommodate various sizes by changing the mask holder ○ Fixing method: Vacuum suction ○ Mask holder: Hinge opening and closing type (with mechanical lock) ○ Alignment: Mask fixed, wafer XYZ∂ axis stage movement ● For more details, please contact us or refer to the catalog.