Development and commercialization of a 1-inch (small-sized) ultra-high vacuum sputter cathode.
Manufactured according to application from a prototype of the world's smallest class spatter cathode single unit.
The ultra-high vacuum 1-inch (compact) sputter cathode is among the smallest in the world and can be custom-made from single prototypes to suit various applications. The background of product development includes the miniaturization of research equipment, the efficient use of rare metal materials, continuity towards high quality, high reproducibility, and technologies applicable for mass production, as well as connections to analysis and evaluation systems. It features direct gas introduction and a water-cooled structure compatible with a φ1-inch target, and comes with a dedicated RF power supply with a built-in matching box, making it easy to install in your existing vacuum chamber, even for UHV applications. For more details, please contact us or refer to the catalog.
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【Features】 ○ ICF flange (ultra-high vacuum standard flange) mount structure → Easy connection to existing UHV chambers, expansion possible ○ Compatible with ultra-high vacuum → Can be connected to ultra-high vacuum surface analysis and evaluation devices, contributing to high-quality film deposition ○ Gas introduction system mount structure → Allows gas introduction to the target surface, enabling an efficient and reproducible plasma environment (density and pressure conditions) → Excellent for creating compound thin films such as oxides and nitrides ○ Contributes to substrate damage reduction and enhances sputtering efficiency (deposition rate) ○ Applicable not only as a sputter cathode but also as a plasma CVD/etching electrode and surface modification plasma source ● For more details, please contact us or refer to the catalog.
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