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  1. Home
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  6. UV-Ozone Cleaning and Modification Device

UV-Ozone Cleaning and Modification Device

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last updated:Jun 21, 2013

エム・シー・ケー 東京 電子事業本部
エム・シー・ケー 東京 電子事業本部

It is a device that removes organic contamination from the workpiece using UV light and improves wettability.

The UV-Ozone cleaning and modification device generates ozone through UV light and removes organic substances by breaking them down into CO2 and other compounds. By modifying the surface of the film, wettability is improved, making it suitable for various applications such as pre-treatment for lamination. Additionally, it operates in a non-contact manner, preventing scratches on the workpiece. 【Comparison with Plasma Cleaning】 ● Low initial cost ● The film surface is less likely to become rough ● Stable quality control through UV intensity ● Reduced running costs (depending on conditions) ◎ For more details, please contact us or download the catalog.

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UV-Ozone Cleaning and Modification Device

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● Can be installed inline with various devices ● Cleaning and modification capabilities can be verified through prior testing ● For various customizations and special specifications, please contact us ◎ For more details, please contact us or download the catalog.

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UV-Ozone Cleaning and Modification Device

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エム・シー・ケー

エム・シー・ケー 東京 電子事業本部

Industrial Machinery

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The next generation concept, the originality of technological development, the provision of new values... MCK, equipped with a high-level development base, has the know-how to materialize and create all of these. MCK's lamination thrives in various scenes. It constantly senses the forefront of the times and contributes to the development of industrial society.

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