List of Cleaning machine products

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

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  • Other conveying machines

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We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!

  • Other semiconductors
  • Processing Contract
  • Wafer

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Are you making this mistake while draining water from your work?

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  • Ultrasonic Cleaner

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Are you making this mistake when draining water from your work?

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  • Other cleaning machines

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No need for water washing!! Air blow cleaning removes stubborn dirt and attached dust with just air.

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  • Ultrasonic Cleaner

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Are you making this mistake while draining water from your work?

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  • Ultrasonic Cleaner

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No need for water washing! Air blow cleaning removes stubborn dirt and attached dust with just air.

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  • Other cleaning machines

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[Patent] Complete water removal in an instant with air blow = complete drying!

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  • Other cleaning machines

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Are you making this mistake when draining water from work?

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  • Other cleaning machines

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Are you making this mistake while draining water from the work?

[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.

Are you making this mistake when draining water from your work?

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  • Other cleaning machines

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【PT】イプロス_ニュースサムネ(550×550).png

Are you making this mistake while draining water from the work?

[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.

Are you making this mistake when draining water from your work?

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  • 水切り導入可能業界.png
  • hojokin.png
  • Ultrasonic Cleaner

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【PT】イプロス_ニュースサムネ(550×550).png

Are you making this mistake while draining water from the work?

[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.

Are you making this mistake with the work's drainage?

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  • 水切り導入可能業界(半導体対応ver).png
  • hojokin.png
  • Ultrasonic Cleaner

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【PT】イプロス_ニュースサムネ(550×550).png

If you see this, you'll understand everything! I created a PR flyer.

100% water removal with air blow! No water droplets left on the workpiece! We have summarized everything about the patented complete drying air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Can it really remove 100% of the water?" "Why is it so effective at removing water?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download it and take a look!

No need for water washing! Air blow cleaning removes stubborn dirt and attached dust with just air.

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  • Other cleaning machines

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Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).

Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.

No need for water washing!! Air blow cleaning with just air, from stubborn dirt to attached dust.

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  • Ultrasonic Cleaner

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【PT】イプロス_ニュースサムネ(550×550) (1).png

Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).

Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.

A must-see for the cleaning and rental uniform industry! Even with a detergent concentration of 1/4, it achieves cleaning effects equal to or greater than standard washing. Demonstrating fine bubble c...

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  • nozzle
  • Other cleaning machines
  • Cleaning agents

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Creating a sustainable workplace with this one device.

  • Other cleaning machines

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A parts box used for transporting automotive parts. It can be thoroughly cleaned of dirt with Cleo's cleaning machine and dried properly!

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  • Other cleaning machines

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Starting tomorrow, we will be exhibiting at the Manufacturing World Osaka 2026 '2nd Smart Maintenance Exhibition'.

Opti Laser Solutions Co., Ltd. will be exhibiting at the "Monozukuri World Osaka 2026 2nd Smart Maintenance Exhibition" held at Intex Osaka from Wednesday, October 7 to Friday, October 9, 2026. At our booth, we will showcase live demonstrations of our laser cleaner. You will be able to see up close the process of removing rust, paint, oil films, and scale, as well as the differences before and after treatment. If you are seeing laser cleaning for the first time or are considering improving the efficiency of your cleaning and stripping processes, please visit our booth. ━━━━━━━━━━━━━━━━━━ ■ Exhibition Overview ━━━━━━━━━━━━━━━━━━ Exhibition Name: Monozukuri World Osaka 2026 2nd Smart Maintenance Exhibition Dates: October 7 (Wednesday) to October 9 (Friday), 2026, 10:00 AM to 5:00 PM Venue: Intex Osaka Booth: Hall 6, Zone A, 41-16 We sincerely look forward to your visit.

Micro-nano bubble and ultra-fine bubble generation CIP cleaning device. Removal of heat-coagulated proteins with CIP cleaning using bubbles, reduction of cleaning time, and reduction of cleaning agent...

  • Other cleaning machines
  • Aeration/air diffusion equipment
  • Other water treatment equipment

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A technical documentation collection that explains everything from the risks of flux residue to cleaning and evaluation in one book.

  • Other cleaning machines

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Introducing a laser cleaning machine that can remove oil, rust, paint, and oxide layers!

  • Other cleaning machines

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A new standard for high-efficiency fluorine cleaning born from the "voices" of the field.

  • Ultrasonic Cleaner

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Based on our years of experience and proven track record, we will contribute to reducing your running costs.

  • Ultrasonic Cleaner

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A simple and easy-to-use cleaning bottle available in a variety of sizes and types, made of low-density PE compliant with US-FDA-21CFR standards.

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  • Other cleaning machines
  • Plastic utensils and containers
  • Other laboratory equipment and containers

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For turbo chillers, chilled and hot water generators, absorption chillers, etc.! Reducing work time and alleviating work burden.

  • Other cleaning machines

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Technical explanation of the mechanism and benefits of ultrasonic cleaning with a heating heater!

  • Ultrasonic Cleaner

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Recommended for water-saving and energy-saving measures! Complies with hygiene and explosion-proof standards. Materials featuring installation examples available. For the food, beverage, and medical f...

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  • nozzle
  • Food Cleaning Equipment
  • Other cleaning machines

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We have uploaded a case study of the tank cleaning nozzle manufactured by Lechler.

We have uploaded a new case study of the Lehira company's tank cleaning nozzle. *Please download the case study from the catalog page.

Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.

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  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Photomask

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Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

For precise cleaning of prisms. Sonosys ultrasonic cleaning device.

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  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Photomask

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Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Powerful cleaning with a special shape nozzle from Lechler! This shape is unique to Lechler!

  • High pressure cleaner
  • nozzle
  • nozzle

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We have uploaded a case study of the tank cleaning nozzle manufactured by Lechler.

We have uploaded a new case study of the Lehira company's tank cleaning nozzle. *Please download the case study from the catalog page.

Lechler's tank cleaning spray nozzle PopUp Whirly now available in ATEX version (explosion-proof type).

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  • Other cleaning machines
  • Food Cleaning Equipment
  • nozzle

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We have uploaded a case study of the tank cleaning nozzle manufactured by Lechler.

We have uploaded a new case study of the Lehira company's tank cleaning nozzle. *Please download the case study from the catalog page.

Next-generation megasonic technology can instantly clear wafers up to 300mm.

  • Photomask
  • Other semiconductor manufacturing equipment
  • Ultrasonic Cleaner

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Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.

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  • 超音波洗浄装置(バス・タンク式).jpeg
  • Zerstäuber-Demo.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Ultrasonic cleaner

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Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.

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  • 超音波洗浄装置(バス・タンク式).jpeg
  • Zerstäuber-Demo.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Ultrasonic cleaner

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sonosys-nano-clean-logo.png

Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Surface cleaning for MEMS device manufacturing with Sonosys ultrasonic cleaning.

  • Triple-nozzle-ecf5619c.jpg
  • 超音波洗浄装置(バス・タンク式).jpeg
  • Zerstäuber-Demo.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Ultrasonic cleaner

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sonosys-nano-clean-logo.png

Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Precision cleaning of optical lenses with Sonosys ultrasonic cleaning.

  • Triple-nozzle-ecf5619c.jpg
  • 超音波洗浄装置(バス・タンク式).jpeg
  • Zerstäuber-Demo.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Ultrasonic cleaner

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Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

Ultrasonic cleaning by Sonosys for slurry removal in CMP engineering.

  • Triple-nozzle-ecf5619c.jpg
  • 超音波洗浄装置(バス・タンク式).jpeg
  • Zerstäuber-Demo.jpg
  • Ultrasonic Cleaner
  • Ultrasonic Oscillator
  • Ultrasonic cleaner

Added to bookmarks

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Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
sonosys-nano-clean-logo.png

Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS

We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.

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