Coating materials can be reduced by up to 1/30! Film formation can be carried out efficiently and at minimal cost!
The "Advanced Coater HIT-III S" is a device that can perform film formation with overwhelming efficiency compared to conventional methods. It can reduce the amount of coating material to less than 1/2 of the traditional spray method and less than 1/30 of the spin method. Additionally, it can perform film formation in a normal pressure environment, eliminating the need for vacuum equipment. This advanced coater contributes to reducing total costs. 【Features】 ■Significantly reduces costs for coating materials and vacuum equipment ■Compatible with weakly acidic, weakly alkaline, and various organic solvents ■Can use materials mixed with larger solid particles ■Exhaust and wastewater treatment can be managed with a minimal system *For more details, please refer to the product catalog available for download.
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<Main Specifications of the Device> Table Size: 300mm × 300mm Movement Range: Left-Right 400mm × Front-Back 450mm × Up-Down 120mm Device Dimensions: 1000mm(W) × 1000mm(D) × 1650mm(H) Device Weight: Approximately 300Kg Liquid Supply Method: Liquid supply system using a syringe pump. 1 system 50ml standard Coating Method: Atomized spray using a two-fluid nozzle. 1 or 2 units Control: Main control using a sequencer, display switches using a touch panel <Examples of Device Use> - Automobiles: Lamps, windshields, bumpers, etc. - Lenses: Hard coatings, anti-reflective films, anti-fog films, etc. - Solar Cells: TiO2, protective films, colored films, etc. - Compound Semiconductors: High-brightness LEDs, etc. - MEMS: Resists, etc. - LCDs: Resists, black matrices, MgO, etc. - Organic EL: Polymers, etc. - Printed Circuit Boards: Copper film formation, resists, embedding, flattening, etc. *For more details, please refer to the product catalog available for download. Feel free to contact us with any inquiries.
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