The cradle lifting mechanism automatically raises the cradle.
This is a device with a proven track record as a wafer drying equipment for the semiconductor industry. It cleans and dries the workpiece using centrifugal force and airflow. The cradle lifting mechanism automatically raises the cradle. For more details, please contact us or download the catalog.
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【Specifications】 ○ Drive Air: 0.5Mpa (5Kg/cm²) ○ Maximum Processing Capacity: 2 units of 6-inch carriers, or 2 to 4 units of carriers under 5 inches ○ Allowable Load Weight: Within 2,000g (load weight for each cradle) ○ ULPA Filter: Yes ○ Ionizer: Yes ○ Control: PLC, Inverter ○ Operation Panel: Button Switch ○ Rotational Speed: 1,000rpm (normal operating speed 800rpm) ○ Motor: Inverter Motor ○ Power Supply: AC200V 3φ 50/60Hz 15A ○ Dimensions: 800(W) × 990(D) × 1004(H) mm, Height when lid is open 1528(H) mm ○ Weight: 180Kg Additionally, we offer devices compatible with up to 8 inches, manual machines, automatic machines, and more. Please feel free to consult us for applications other than semiconductors. ● For more details, please contact us or download the catalog.
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Leave it to us for centrifuges.
![[Patent] Instant complete drying with air blow. No drying equipment required.](https://image.mono.ipros.com/public/product/image/8a8/2001151279/IPROS8770219105683274310.png?w=280&h=280)
![[Patent] Instant complete drying with air blow. No drying equipment required.](https://image.mono.ipros.com/public/product/image/2116982/IPROS5666330813096939820.png?w=280&h=280)
